Photodiode-TFT Layout With Integrated Light Blocking

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Solution Overview

Problem

Existing detection devices require additional manufacturing processes to implement light-blocking layers for thin-film transistors, increasing complexity and cost.

Innovation Solution

A detection device design that incorporates a thin-film transistor with a semiconductor layer between a light-blocking layer and a photodiode, and an electrode layer between the semiconductor layer and the photodiode, reducing the number of manufacturing processes needed.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Object-affected harmful factors

If light-blocking layers are provided on both sides of the semiconductor with the semiconductor interposed therebetween, then light blocking to the thin-film transistor is improved, but the number of manufacturing processes increases

Engineering Contradiction:
Improvelight blockingVSAvoidnumber of manufacturing processes
Core Design Contradiction:
Object-affected harmful factorsVSDevice complexity

Solution Approach 1:

The patent extracts the light-blocking function from a separate layer and integrates it into the electrode layer that already exists in the thin-film transistor structure. The electrode layer is designed to serve dual purposes: electrical conduction and light blocking, thereby eliminating the need for additional light-blocking layers and reducing manufacturing complexity

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The electrode layer is designed to perform multiple functions simultaneously: it serves as both the electrical electrode for the thin-film transistor and as the light-blocking layer. This multi-functional design reduces the total number of layers and manufacturing processes while achieving effective light blocking to prevent photovoltaic effects

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Measurement precision

If additional light-blocking layers are added to block light to the thin-film transistor, then detection accuracy is improved, but device complexity increases

Engineering Contradiction:
Improvedetection accuracyVSAvoiddevice complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent merges the electrode layer and light-blocking layer into a single integrated structure. The electrode layer is positioned and designed to simultaneously perform electrical function and optical blocking function, thereby achieving accurate detection without increasing device complexity

Inventive Principle:
Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution effectively blocks light to the thin-film transistor using fewer manufacturing processes, enhancing efficiency and reducing costs while maintaining detection accuracy.

Implementation Method 1

Optical sensors capable of detecting a fingerprint pattern and/or a vein pattern are known

Methodology Applied
Scientific EffectPhotoelectric effect: Photoelectric Effect

Implementation Method 2

light blocking is required to reduce malfunctions that are caused by a photovoltaic effect of a semiconductor

Methodology Applied
Scientific EffectLight blocking: Absorption (EM radiation)

Data Source

PatentUS20250063883A1Detection device
Publication Date: 2025.02.20 JAPAN DISPLAY INC
  • US20250063883A1 patent drawing
  • US20250063883A1 patent drawing
  • US20250063883A1 patent drawing

AI summary

A detection device includes a photodiode, and a thin-film transistor coupled to the photodiode. The thin-film transistor includes a semiconductor layer between a light-blocking layer and the photodiode, and an electrode layer between the semiconductor layer and the photodiode, and the electric layer includes a source electrode and a drain electrode of the thin-film transistor. The source electrode extends to a position facing the light-blocking layer with the semiconductor layer interposed therebetween.