Photoelectric Conversion Layer Stack for Faster Imaging Response

The patent segments the interface region between the photoelectric conversion layer and the electrode into multiple functional layers: an electron block layer with specific anisotropic electric susceptibility (≥413) or intramolecular dipole moment (≥1.84 debye), and a work function adjustment layer with electron affinity or work function larger than the first electrode. This segmentation allows each layer to perform its specific function optimally, improving response speed while maintaining manageable device complexity through modular design

The patent applies parameter changes by specifying critical material properties: the electron block layer must have anisotropic electric susceptibility of 413 or more or intramolecular dipole moment of 1.84 debye or more, and the work function adjustment layer must have electron affinity or work function larger than the first electrode. These parameter specifications optimize charge carrier blocking and energy level alignment, directly improving response speed without requiring fundamental structural changes

The patent defines specific parameter ranges for the electron block layer (anisotropic electric susceptibility ≥413 or intramolecular dipole moment ≥1.84 debye) and work function adjustment layer (electron affinity or work function larger than the first electrode). These parameter specifications create clear manufacturing targets that balance performance optimization with manufacturability, allowing standard fabrication processes to achieve the required precision

The work function adjustment layer acts as an intermediary between the electron block layer and the electrode, with its electron affinity or work function being larger than the first electrode. This intermediary layer facilitates optimal energy level alignment and charge carrier management, improving response speed while distributing the manufacturing complexity across multiple layers with well-defined properties