Photoformed Silicone Sensor Membrane Patterning
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Solution Overview
Problem
Existing silicone-based gas permeable membranes for sensors are not directly photoformable, requiring complex indirect methods for patterning, which increases manufacturing costs and reduces yield.
Innovation Solution
A photoformed silicone membrane is created using a directly photoformable organosiloxane polymer that is permeable to gaseous molecules but impermeable to non-gaseous molecules and ions, achieved by applying UV radiation to form a membrane on a surface and then selectively removing unexposed polymer with a developer.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If indirect photo-patterning methods are used with non-photoformable silicone materials, then gas permeable membranes can be manufactured, but the manufacturing process becomes complex and costly
Solution Approach 1:
The patent uses a photoresist layer as an intermediary material to enable patterning of non-photoformable silicone copolymer membranes. The photoresist absorbs UV radiation and undergoes chemical changes that allow selective removal, thereby defining the pattern in the underlying membrane without requiring the membrane material itself to be photoactive.
Solution Approach 2:
The patent applies a photoresist coating to the silicone copolymer membrane before attempting to create the pattern. This preliminary step prepares the surface for selective etching by providing a layer that can be differentially removed based on UV exposure, thus enabling subsequent precise patterning of the membrane.
2Reliability
If indirect photo-patterning methods are used with non-photoformable silicone materials, then gas permeable membranes can be manufactured, but manufacturing yield decreases and cost increases
Solution Approach 1:
The photoresist layer serves as a mediator that enables precise patterning with high yield. By using the photoresist to define the pattern areas and then selectively removing only the exposed or unexposed regions (depending on positive or negative resist), the process achieves high precision and consistency, reducing defects and improving overall manufacturing yield.
3Manufacturing precision
If indirect photo-patterning methods are used, then patterned membranes can be created, but the process requires multiple steps including coating, exposing, and developing
Solution Approach 1:
The photoresist intermediary enables precise pattern transfer through a standardized three-step process: coating the resist, exposing to UV light through a mask, and developing to remove exposed or unexposed regions. This well-established photolithographic approach ensures high pattern fidelity while maintaining reasonable process simplicity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method simplifies the manufacturing process, reduces costs, and improves the reliability and fidelity of microstructure dimensions, allowing for efficient detection of various molecules and ions while maintaining gas permeability and ion impermeability.
Implementation Method 1
applying ultraviolet (UV) radiation to at least a portion of the layer to cause the polymer to form an adhered membrane on the surface
Implementation Method 2
a photoformed organosiloxane polymer membrane that is substantially permeable to gaseous molecules and substantially impermeable to non-gaseous molecules and ions
Data Source
AI summary
A sensing device includes a sensing surface, and a matrix overlaying the sensing surface. The sensing device includes a photoformed membrane overlaying at least a portion of the matrix. The photoformed membrane includes a directly photoformed organosiloxane polymer that is substantially permeable to gaseous molecules and substantially impermeable to non-gaseous molecules and ions.