Photolithography Track Interface Layout for Post-Exposure Delay Control

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Solution Overview

Problem

The productivity and quality of semiconductor devices are compromised due to delays in the photolithography process, particularly the post-exposure delay time, which affects the critical dimension and overall performance, and existing in-line type photolithography apparatuses have limitations in improving productivity due to the interdependence of exposure and track portion operations.

Innovation Solution

A photolithography apparatus with multiple track portions and an interface portion that transfers substrates between exposure and track portions, allowing for simultaneous operation of normal track portions and selective operation when abnormalities occur, while minimizing stop losses and performance degradations by utilizing multiple transport members and a standby region.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a single track portion is used in an in-line photolithography apparatus, then the delay time between exposure and post-exposure bake can be minimized, but the productivity is limited due to the interdependence of exposure and track portion operations

Engineering Contradiction:
Improvedelay time controlVSAvoidphotolithography process productivity
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The track portion is divided into multiple independent track portions (first track portion and second track portion), each capable of performing coating, developing, and other processes independently. This segmentation allows parallel processing of multiple substrates, improving productivity while maintaining delay time control through independent operation of each track portion.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Each track portion is designed to perform multiple functions (coating process, developing process, and other processes) independently. This multi-functionality allows any track portion to handle complete substrate processing, enabling flexible parallel operations and improving overall productivity without compromising delay time management.

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Productivity

If multiple track portions are added to improve productivity, then the operation rate of the exposure portion can be maximized, but the device complexity increases

Engineering Contradiction:
Improvephotolithography process productivityVSAvoidapparatus structure complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The apparatus is segmented into multiple identical track portions that can be independently controlled. Each track portion maintains the same functional structure, simplifying the overall design approach while enabling parallel processing. The segmentation allows scalable complexity management where additional track portions can be added without redesigning the entire system.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Multiple track portions are prepared in advance with identical functional capabilities, allowing them to be activated simultaneously for parallel processing. This preliminary preparation of multiple independent processing units enables productivity improvement without requiring complex real-time coordination mechanisms during operation.

Inventive Principle:
Principle #10Preliminary action

3Device complexity

If a single transport member is used, then the device complexity is minimized, but stop losses occur when the transport member is abnormal

Engineering Contradiction:
Improvetransport system complexityVSAvoidcontinuous operation reliability
Core Design Contradiction:
Device complexityVSReliability

Solution Approach 1:

The transport function is segmented across multiple independent transport members, each associated with specific track portions. This segmentation ensures that a failure in one transport member does not affect others, maintaining system reliability while avoiding the complexity of a single overly-critical transport system.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

Multiple transport members are provided as backup resources before failures occur. When one transport member becomes abnormal, other transport members can immediately take over its substrate transfer tasks, preventing stop losses and maintaining continuous operation without requiring complex real-time failure response mechanisms.

Inventive Principle:
Principle #11Beforehand cushioning (Prior cushioning)

4Reliability

If multiple transport members and standby regions are added, then stop losses are minimized and reliability is improved, but the device complexity increases

Engineering Contradiction:
Improvecontinuous operation reliabilityVSAvoidtransport system complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The transport system is segmented into multiple independent transport members with dedicated standby regions. Each segment can operate independently, and failures in one segment do not propagate to others. This modular segmentation improves reliability while keeping each individual segment relatively simple in design.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The system changes the parameter of transport member quantity from one to multiple, and introduces standby regions as additional capacity. This parameter change increases reliability by providing redundancy, while the modular nature of the changes keeps the complexity increase manageable and scalable.

Inventive Principle:
Principle #35Parameter changes

Data Source

PatentUS20240377760A1Photolithography apparatus and operation method of the same
Publication Date: 2024.11.14 SAMSUNG ELECTRONICS CO LTD
  • US20240377760A1 patent drawing
  • US20240377760A1 patent drawing
  • US20240377760A1 patent drawing

AI summary

A photolithography apparatus according to an embodiment includes an exposure portion performing an exposure process, a plurality of track portions each performing a coating process and a developing process, and an interface portion connecting the exposure portion and the plurality of track portions to transfer a substrate on which a photolithography process is performed between the exposure portion and the plurality of track portions.