Photomask Case Elastic Holding Mechanism for Impact Protection
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Solution Overview
Problem
The existing photomask technologies face issues with dust particles causing poor image quality, requiring stringent cleanliness, and are prone to impact damage and excessive pressing, which affects the precision and reliability of microcircuit manufacturing.
Innovation Solution
A photomask case structure featuring an upper and lower cover with supporters and position fixing pieces, where elastic holding portions and beveled edges securely fix the photomask, minimizing friction and contact area to reduce dust generation and provide cushioning against excessive pressure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the photomask is firmly fixed in the photomask case, then impact damage is prevented, but excessive pressing may damage the photomask
Solution Approach 1:
The patent applies beforehand cushioning by incorporating elastic holding portions that can deform elastically when the upper cover is pressed down. These elastic portions absorb impact energy and provide cushioning protection, preventing excessive pressing damage to the photomask while still securing it firmly against impact
Solution Approach 2:
The patent changes the physical state parameter of the holding portions by making them elastic rather than rigid. This allows the holding force to be dynamically adjusted - firm under normal conditions for protection, but yielding under excessive force to prevent damage
2Stability of the object's composition
If the contact area between photomask and photomask case is increased, then stability is improved, but friction increases and dust particles are generated
Solution Approach 1:
The patent extracts the supporting function from the case walls and concentrates it onto discrete supporting pieces. This reduces the contact area between the photomask and the case, minimizing friction and dust generation while maintaining stability through the strategically positioned supporting pieces
Solution Approach 2:
The patent applies local quality by providing support only at specific locations (corners or edges) rather than along the entire perimeter. The supporting pieces are positioned to provide adequate stability while minimizing overall contact area and friction
3Object-generated harmful factors
If the photomask is loosely held in the photomask case, then friction and dust generation are reduced, but position stability deteriorates
Solution Approach 1:
The patent applies local quality by providing position fixing pieces at specific locations (opposite sides or corners) rather than continuous contact. This localized fixing provides adequate position stability while maintaining minimal overall contact area to reduce friction and dust generation
Solution Approach 2:
The patent segments the position fixing function into discrete position fixing pieces rather than continuous contact. These segmented fixing points provide sufficient stability for precise positioning while minimizing total contact area
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The structure effectively prevents impact damage, reduces dust particle production, and ensures precise positioning of the photomask, enhancing the reliability and quality of microcircuit manufacturing processes.
Implementation Method 1
an elastic holding portion, able to elastically hold the sides of the photomask
Implementation Method 2
a press portion able to elastically press down and fix the photomask
Data Source
AI summary
The present invention relates to a photomask case structure, and more particularly to a photomask case able to firmly fix position of a photomask, which includes an upper cover, a lower cover, supporters and position fixing pieces. Accordingly, when a photomask is retained within the photomask case, then elastic holding portions of the position fixing pieces are used to elastically hold one side of the photomask, beveled edges of the position fixing pieces are used to hold another side of the photomask, and finally press portions of the elastic holding portions are used to elastically press down on the surface of the photomask, thereby firmly retaining the photomask within the photomask case, and preventing impact damage to the photomask from occurring.