Photomask for Color Filter Substrate Manufacturing
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Solution Overview
Problem
The existing manufacturing process of color filter substrates for TFT-LCD devices is complex, leading to reduced manufacturing efficiency and increased costs.
Innovation Solution
A photomask with distinct transmittance portions is used to simultaneously form a flat layer, auxiliary spacer, and main spacer on the color filter substrate, simplifying the patterning process and reducing costs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple separate patterning procedures are used to form black matrix, color barriers, and spacers, then each component can be formed with precise control, but the manufacturing process becomes complex and efficiency decreases
Solution Approach 1:
The patent combines multiple patterning procedures into a single photomask that simultaneously patterns the black matrix, color barriers, and spacers. The photomask integrates multiple functional regions (transparent region for black matrix, first semi-transparent region for color barriers, second semi-transparent region for spacers) into one component, allowing all elements to be formed in one exposure step rather than through multiple separate procedures.
Solution Approach 2:
The photomask serves multiple functions simultaneously: it acts as the patterning tool for the black matrix, the color barriers, and the spacers. By designing the photomask with different transmittance characteristics in different regions, a single component performs what previously required multiple specialized patterning tools and procedures.
2Manufacturing precision
If multiple separate patterning procedures are used to form black matrix, color barriers, and spacers, then each component can be formed with precise control, but production efficiency decreases
Solution Approach 1:
The patent combines multiple patterning procedures into a single photomask that simultaneously patterns the black matrix, color barriers, and spacers. The photomask integrates multiple functional regions (transparent region for black matrix, first semi-transparent region for color barriers, second semi-transparent region for spacers) into one component, allowing all elements to be formed in one exposure step rather than through multiple separate procedures.
Solution Approach 2:
The photomask is pre-designed with specific transmittance characteristics in different regions before the patterning process. The transparent region, first semi-transparent region, and second semi-transparent region are configured in advance to achieve the desired pattern complexity in a single exposure step, eliminating the need for multiple sequential patterning operations.
3Productivity
If a photomask with different transmittance portions is used to form multiple components simultaneously, then manufacturing process is simplified and efficiency improves, but manufacturing precision may be compromised
Solution Approach 1:
The photomask employs local quality by assigning different transmittance properties to different regions: the transparent region allows full light transmission for black matrix formation, the first semi-transparent region allows partial transmission for color barrier formation, and the second semi-transparent region allows different partial transmission for spacer formation. This localized differentiation ensures each component receives the appropriate exposure dose for precise patterning.
Solution Approach 2:
The patent utilizes parameter changes by varying the light transmittance parameter across different regions of the photomask. By controlling the transmittance values in the transparent, first semi-transparent, and second semi-transparent regions, the patent achieves distinct exposure effects that enable precise formation of different components with a single photomask.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed method significantly simplifies the manufacturing process and reduces costs by allowing the simultaneous formation of the flat layer, auxiliary spacer, and main spacer, improving production efficiency of the color filter substrate.
Implementation Method 1
performing a patterning procedure on the insulation layer with a photomask, so as to form a flat layer, an auxiliary spacer, and a main spacer
Data Source
AI summary
Provided are a photomask and a method of manufacturing a color filter substrate. This belongs to the field of display technologies, and can be used to simplify manufacturing process of the color filter substrate and improve manufacturing efficiency of the color filter substrate.