Photomask Curing Chamber with Spring Tensioning

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Solution Overview

Problem

The curing of adhesive used in photomask stud attachment is time-consuming, limiting the availability of usable photomasks in patterning processes, particularly in extreme ultraviolet (EUV) lithography.

Innovation Solution

A curing chamber and method that utilize a holder, clamp, and spring to tension a photomask against a clamp, with a conveyor system to transfer multiple photomasks through a curing chamber for adhesive curing, employing a heating mechanism to maintain a consistent temperature and atmospheric pressure for efficient curing.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If adhesive curing is performed using conventional single-photomask methods, then the adhesive can be cured, but the process is time-consuming and limits photomask availability

Engineering Contradiction:
Improvephotomask availabilityVSAvoidcuring time
Core Design Contradiction:
ProductivityVSLoss of time

Solution Approach 1:

The curing system is segmented into multiple independent curing chambers, each capable of curing one or more photomasks simultaneously. This segmentation allows parallel processing of multiple photomasks, reducing total curing time and increasing photomask availability in the patterning process

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The invention transitions from sequential single-photomask curing to parallel multi-photomask curing by adding a spatial dimension. Multiple photomasks are cured simultaneously in different chambers or at different positions within the curing system, effectively reducing the time loss associated with sequential processing

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Productivity

If multiple photomasks are cured simultaneously using a conveyor system, then productivity increases, but the device complexity increases

Engineering Contradiction:
Improvecuring throughputVSAvoidcuring chamber structure
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The curing chamber is designed with multi-functionality to handle multiple photomasks simultaneously. The same curing chamber can process different numbers of photomasks depending on the configuration, and the conveyor system can accommodate various arrangements, reducing the need for multiple specialized chambers

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

A conveyor system serves as an intermediary mechanism to transfer photomasks between preparation areas and curing chambers. This intermediary allows for automated, organized transport of multiple photomasks, simplifying the overall system architecture compared to manual handling of each photomask individually

Inventive Principle:
Principle #24Intermediary (Mediator)

3Adaptability or versatility

If studs are re-adhered to photomasks, then replacement is possible, but the adhesive curing time extends the process duration

Engineering Contradiction:
Improvestud replacement capabilityVSAvoidprocess duration
Core Design Contradiction:
Adaptability or versatilityVSDuration of action of moving object

Solution Approach 1:

Photomasks with studs are prepared and placed in the curing chamber before the actual curing cycle begins. The preliminary positioning and preparation of multiple photomasks allows the curing process to start immediately without delays, reducing the total process duration while maintaining the ability to replace studs as needed

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution significantly reduces the time required for adhesive curing, allowing for increased availability of photomasks in lithography processes and streamlining the photomask assembly process.

Implementation Method 1

a spring that tensions the photomask against the clamp

Methodology Applied
Scientific EffectSpring force: Spring

Implementation Method 2

employing a heating mechanism to maintain a consistent temperature

Methodology Applied
Scientific EffectHeating: Heating

Data Source

PatentUS10962889B2Method and apparatus for high throughput photomask curing
Publication Date: 2021.03.30 APPLIED MATERIALS INC
  • US10962889B2 patent drawing
  • US10962889B2 patent drawing
  • US10962889B2 patent drawing

AI summary

Embodiments of the present disclosure generally relate to methods and apparatus for preparing a photomask for a lithography process. In one embodiment, a curing chamber is disclosed that includes an elevator adapted to receive a plurality of holder units. Each of the holder units comprise a holder, a clamp holding a photomask, one or more studs coupled to the photomask by an adhesive, and a spring coupled to each of the one or more studs.