Photomask Edge Test Patterns for Multi-Exposure Alignment

The patent applies preliminary action by placing test patterns on the photomask before the exposure process. These test patterns enable detection of alignment errors before actual wire formation, allowing correction of misalignment issues that would otherwise cause wires to be positioned incorrectly at boundaries during multi-exposure processes for large-sized display devices

The patent implements feedback by using test patterns that provide information about alignment accuracy. The test patterns are exposed along with the main patterns, and their resulting positions are measured to determine whether the photomask was properly aligned during shifting. This feedback mechanism allows operators to detect and correct alignment errors, ensuring wires are formed at their intended positions rather than at incorrect boundary locations

The patent applies preliminary action by incorporating test patterns into the photomask design before manufacturing begins. These test patterns are exposed simultaneously with the main wire patterns, enabling alignment verification to be performed as part of the normal exposure process without requiring separate additional steps, thus maintaining manufacturing speed while ensuring wire shape accuracy

The patent implements self-service by designing the photomask to contain its own alignment verification mechanism. The test patterns on the photomask automatically provide alignment information during the exposure process itself, eliminating the need for external alignment checking equipment or procedures. This allows the photomask to serve both as the exposure tool and as its own alignment verification system, maintaining productivity while ensuring manufacturing precision