Photomask Pattern Interruptions for GOA Drive Circuit ESD Control

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Solution Overview

Problem

During the manufacturing process of display panels using Gate Driver on Array (GOA) technology, photomasks tend to accumulate electrostatic charges, leading to Electro Static Discharge (ESD) and circuit damage, which affects the yield of the drive circuit production.

Innovation Solution

Incorporating interruptions in the pixel control circuit patterns of the photomask, with a preset distance between them, to release static electricity generated during exposure, thereby reducing the risk of electrostatic discharge and ensuring the integrity of the formed pixel control circuit.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If photomask is used for exposing during drive circuit manufacturing, then the display panel can be manufactured with GOA technology, but the photomask accumulates electrostatic charges causing ESD that damages circuits and reduces yield

Engineering Contradiction:
Improvemanufacturing yieldVSAvoidelectrostatic discharge damage
Core Design Contradiction:
ProductivityVSObject-affected harmful factors

Solution Approach 1:

The pixel control circuit pattern on the photomask is divided into multiple segments by introducing interruptions. These interruptions break the continuous conductive path into discrete sections, allowing electrostatic charges to be released at multiple points along the pattern rather than accumulating in a continuous structure, thereby preventing ESD damage during exposing

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The interruptions in the pixel control circuit pattern act as intermediary elements that facilitate the release of electrostatic charges. By introducing these intermediate structures, the photomask can dissipate accumulated charges through the interruptions, preventing the buildup that would lead to harmful ESD events

Inventive Principle:
Principle #24Intermediary (Mediator)

2Reliability

If photomask pattern is made continuous for complete circuit design, then the circuit functionality is maintained, but electrostatic charge accumulation occurs leading to ESD

Engineering Contradiction:
Improvecircuit functionalityVSAvoidelectrostatic charge accumulation
Core Design Contradiction:
ReliabilityVSObject-generated harmful factors

Solution Approach 1:

The continuous pixel control circuit pattern is segmented into multiple sections by introducing interruptions at specific locations. This segmentation maintains the essential circuit functionality while creating multiple discharge paths that prevent electrostatic charge accumulation, thereby eliminating ESD risk without compromising circuit operation

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The interruptions are strategically placed at specific locations within the pixel control circuit pattern where they provide localized electrostatic discharge capability. This local modification allows the majority of the circuit to maintain its continuous, functional structure while specific regions are modified to release charges, preventing overall charge accumulation

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The method effectively reduces the accumulation of electrostatic charges on the photomask, minimizing the risk of damage to components and ensuring the normal operation of the drive circuit, thereby improving the yield of the manufacturing process.

Implementation Method 1

the photomask includes pixel control circuit patterns, and the pixel control circuit patterns are provided with a plurality of interruptions configured to release static electricity generated in the pixel control circuit pattern during exposing

Methodology Applied
Scientific EffectElectrostatic Discharge: Electrostatic Discharge

Data Source

PatentUS20240347552A1Method for manufacturing drive circuit, drive circuit and photomask
Publication Date: 2024.10.17 HKC CORP LTD
  • US20240347552A1 patent drawing
  • US20240347552A1 patent drawing
  • US20240347552A1 patent drawing

AI summary

The present application disclosed a method for manufacturing a drive circuit, a drive circuit and a photomask, the method covers a photomask (100) on the photoresist layer and performing exposing; the photomask (100) includes pixel control circuit patterns (101), and the pixel control circuit patterns (101) are provided with a plurality of interruptions (102), and a length of the interruption (102) between two adjacent pixel control circuit patterns (101) is a preset distance, to release static electricity generated in the pixel control circuit pattern (101) during exposing; the electrostatic charges on the pixel control circuit patterns (101) can be effectively derived, and the accumulation of electrostatic charges on the pixel control circuit patterns (101) can be avoided, and the probability of electrostatic discharge can be reduced, thereby reducing the risk of damaging to the components used for exposing, and can ensure the integrity of the formed pixel control circuit, so that the drive circuit can operate normally.