Photomask Laser Correction for Consistent Precision Etching
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Solution Overview
Problem
Existing photomasks used in semiconductor and display device manufacturing lack precision due to variations in laser output and etching amounts, leading to inconsistent etching results.
Innovation Solution
A photomask correction method and apparatus that measures the intensity profile of a laser using a beam profiler, adjusts process parameters based on a stored library of etching amount data, and corrects the photomask using a laser to achieve precise etching.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a photomask is used in the photography process, then the circuit pattern can be exposed on the substrate, but the photomask lacks precision due to variations in laser output and etching amounts
Solution Approach 1:
The patent performs a correction process on the photomask before the actual photography process. A correction laser irradiates the photomask to pre-adjust and compensate for potential deformation or unevenness, ensuring the photomask achieves the required precision and flatness before use. This preliminary correction action eliminates variations in laser output and etching amounts that would otherwise occur during normal operation.
2Manufacturing precision
If a correction process is performed on the photomask, then the precision can be increased, but the device complexity increases
Solution Approach 1:
The correction laser apparatus is integrated into the existing photomask manufacturing system, serving multiple functions: it corrects photomask deformation, ensures flatness, and compensates for laser output variations. By incorporating this correction capability into the standard photomask processing workflow, the system achieves high precision without requiring separate, complex correction equipment, thus managing device complexity while improving manufacturing precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances photomask precision by ensuring consistent etching amounts across different stages of laser usage, thereby improving the accuracy of semiconductor and display device manufacturing processes.
Implementation Method 1
heating a liquid film in the second region with the laser for the determined irradiation time
Implementation Method 2
heating a liquid film in the second region with the laser
Implementation Method 3
forming a liquid film by supplying a chemical solution on a photomask
Data Source
AI summary
A photomask correction method capable of increasing the photomask precision is provided. The photomask correction method comprises measuring an intensity profile of a laser, acquiring etching amount data corresponding to the measured intensity profile using a library, determining a process parameter of the laser based on the etching amount data, and correcting a photomask with the laser according to the determined process parameter.