Photomask-Based Nucleic Acid Array Patterning

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Solution Overview

Problem

Current methods for producing nucleic acid arrays in situ face challenges in achieving high fidelity and precise chemistry, especially at small feature sizes, and existing technologies like bead arrays result in random barcoded arrays that require decoding and have variability in oligonucleotide density.

Innovation Solution

The method involves using photomasks and photohybridization-ligation to generate combinatorial barcodes on a substrate through sequential rounds of light exposure, hybridization, and ligation, allowing for precise control of feature size and uniformity across arrays without the need for decoding, using photo-cleavable moieties and photolithography to selectively remove and reapply photoresist and ligate oligonucleotides.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If bead arrays are used to generate barcoded arrays, then array production is simplified, but the arrays exhibit random barcode distribution and require decoding with reduced fidelity

Engineering Contradiction:
Improvearray productionVSAvoidbarcode fidelity
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent divides the array fabrication process into discrete photolithography steps with photomasks, where each mask defines specific barcode regions. This segmentation allows precise control over barcode placement and composition, eliminating the random distribution problem of bead arrays while maintaining ease of manufacture through standardized photolithography techniques.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent applies photomasks and photoresist in preliminary steps to predefine barcode patterns before oligonucleotide attachment. By performing photolithography patterning beforehand, the system establishes precise spatial control over barcode locations, ensuring high fidelity without requiring post-fabrication decoding.

Inventive Principle:
Principle #10Preliminary action

2Manufacturing precision

If photomasks and photohybridization-ligation are used to generate combinatorial barcodes, then spatial resolution and barcode diversity are improved, but the process complexity increases

Engineering Contradiction:
Improvespatial resolutionVSAvoidprocess complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent employs photomasks that serve multiple functions: defining spatial patterns, controlling oligonucleotide attachment locations, and enabling combinatorial barcode generation through sequential rounds. This multi-functionality achieves high spatial resolution and barcode diversity while managing process complexity by consolidating multiple control functions into a single versatile tool.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The patent uses sequential rounds of photolithography, hybridization, and ligation in a periodic cycle. Each round builds upon the previous one to progressively construct combinatorial barcodes with high spatial resolution. This periodic approach breaks down the complex process into manageable repetitive steps, making the overall process more controllable despite the increased precision requirements.

Inventive Principle:
Principle #19Periodic action

3Manufacturing precision

If photomasks are used for light-controlled surface patterning, then feature size uniformity and composition consistency are improved, but the manufacturing time increases due to sequential rounds

Engineering Contradiction:
Improvefeature size uniformityVSAvoidmanufacturing time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The patent maintains continuous useful action by performing sequential rounds of photolithography, hybridization, and ligation without interrupting the overall fabrication flow. Each round builds upon the previous one, with photoresist removal and reapplication enabling continuous pattern definition. This continuity ensures feature size uniformity while minimizing idle time between steps.

Inventive Principle:
Principle #20Continuity of useful action

Solution Approach 2:

The patent performs preliminary photolithography patterning and photoresist application before each hybridization-ligation round. By preparing the photomask patterns in advance, the system ensures precise feature size control is established beforehand, allowing the subsequent biochemical steps to proceed efficiently without compromising uniformity, thus reducing overall manufacturing time.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables the creation of arrays with high spatial resolution and diversity of barcodes, ensuring consistent feature sizes and compositions, reducing oligonucleotide fidelity loss and eliminating the need for decoding, thus improving the precision and throughput of nucleic acid array production.

Implementation Method 1

using photomasks and photohybridization-ligation to generate combinatorial barcodes on a substrate through sequential rounds of light exposure, hybridization, and ligation

Methodology Applied
Scientific EffectPhotolithography: Photopolymerisation

Implementation Method 2

photohybridization-ligation to generate combinatorial barcodes on a substrate through sequential rounds of light exposure, hybridization, and ligation

Methodology Applied
Scientific EffectPhotohybridization: Photosynthesis

Implementation Method 3

using photo-cleavable moieties and photolithography to selectively remove and reapply photoresist

Methodology Applied
Scientific EffectPhotodissociation: Photodissociation

Data Source

PatentUS20240060127A1Methods and systems for light-controlled surface patterning using photomasks
Publication Date: 2024.02.22 10X GENOMICS INC
  • US20240060127A1 patent drawing
  • US20240060127A1 patent drawing
  • US20240060127A1 patent drawing

AI summary

Provided in some aspects are methods for light-controlled in situ surface patterning of a substrate using a minimal mask scheme. Systems and kits employing the methods are also disclosed. In some embodiments, a method disclosed herein comprises using photomasks and photoresist for photocontrollable hybridization and/or ligation of nucleic acid molecules, wherein photoresist removal allows hybridization and/or ligation of nucleic acid molecules at the exposed area. A large diversity of barcodes can be created in molecules on the substrate via sequential rounds of light exposure, hybridization, and ligation.