Photomask OPC Pattern With T-Shaped Corner Correction
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Solution Overview
Problem
Current optical proximity correction (OPC) technologies fail to accurately form right-angled corners in semiconductor manufacturing due to corner rounding issues during pattern transfer.
Innovation Solution
A pattern for optical proximity correction that includes a T-shaped portion connected to the right-angled corner of a main body portion, with specific angle and distance criteria, is designed before OPC, allowing for precise correction of the corner.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If current OPC technology is used to correct patterns, then general pattern formation is achieved, but right-angled corners cannot be accurately formed due to corner rounding
Solution Approach 1:
The patent applies preliminary action by adding a T-shaped portion to the pattern before performing OPC. This pre-modification ensures that when OPC is applied, the corner rounding issue can be effectively corrected because the T-shaped portion provides additional geometric features that guide the optical proximity correction algorithm to achieve accurate right-angled corners in the final pattern
Solution Approach 2:
The patent applies local quality by introducing a T-shaped portion specifically at the corner region where accuracy is needed, while leaving the rest of the pattern unchanged. This localized modification allows the OPC algorithm to focus correction efforts on the corner area, improving corner accuracy without affecting other parts of the pattern
2Manufacturing precision
If T-shaped portion is added to the pattern before OPC, then corner accuracy is improved, but pattern complexity increases
Solution Approach 1:
The T-shaped portion is introduced only at the corner region where it is needed for correction, rather than modifying the entire pattern. This localized approach minimizes the increase in overall pattern complexity while achieving the desired corner accuracy improvement
Solution Approach 2:
The correction pattern is segmented into the original main body pattern and the added T-shaped portion. This segmentation allows the OPC algorithm to process the corner region separately with specialized correction rules, improving corner accuracy without requiring complete redesign of the entire pattern
Data Source
AI summary
Provided are a pattern for optical proximity correction and a designing method of a photomask pattern. The pattern for optical proximity correction includes a main body portion and a T-shaped portion. The main body portion has at least one right-angled corner. The right-angled corner is composed of a first side and a second side. The T-shaped portion includes a head portion and an extension portion. The extension portion is connected to the right-angled corner. An angle between an extension direction of the extension portion and the first side or the second side is between 130 degrees and 140 degrees.