Photomask Pellicle Clamping Frame for Adhesive Failure Prevention
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Solution Overview
Problem
Existing photomask protection systems face issues with the pellicle being easily torn from the frame due to adhesive failure, leading to damage and scrapping of the entire system during dust particle removal.
Innovation Solution
A photomask protection device with a frame that includes a clamping space to securely fix the edges of the pellicle, preventing separation from the frame and enhancing the fixing effect, using a first adhesive layer to adhere the pellicle to the frame within the clamping space.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If the pellicle is directly adhered to the frame using adhesive, then the structure is simple and easy to manufacture, but the adhesive fails due to aging causing gaps and pellicle detachment
Solution Approach 1:
The frame is segmented into a body portion and a clamping portion that extends from the body. The clamping portion creates a clamping space that mechanically segments the attachment method into two stages: initial adhesive bonding followed by mechanical clamping engagement of the pellicle edges, thereby distributing the attachment function across multiple structural elements
Solution Approach 2:
The attachment system uses a composite approach combining adhesive material and mechanical clamping structure. The adhesive provides initial bonding while the clamping portion of the frame provides mechanical constraint, creating a hybrid attachment system that leverages both chemical and mechanical bonding mechanisms to prevent detachment
2Productivity
If an air knife is used to sweep dust particles, then dust removal is effective, but the pellicle is easily torn from the gap causing damage
Solution Approach 1:
The clamping portion of the frame is designed to engage the edges of the pellicle beforehand, creating a mechanical constraint that cushions and protects the pellicle attachment points. This pre-established mechanical support prevents the pellicle from being torn away when subjected to the forces of air knife dust removal
Solution Approach 2:
The clamping structure applies preliminary counter-action forces to the pellicle edges, creating a restraining force that opposes the detaching forces generated during air knife operation. This preliminary anti-action prevents the pellicle from detaching at the gaps where adhesive failure occurs
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively prevents the pellicle from being torn during dust particle removal, ensuring the photomask protection system's integrity and reliability, thereby reducing the risk of damage and scrapping.
Implementation Method 1
using a first adhesive layer to adhere the pellicle to the frame within the clamping space
Data Source
AI summary
A photomask protection device, a photomask protection system, and a use method of a photomask protection system are provided. The photomask protection device includes a frame and a pellicle. The frame is disposed on a substrate of a photomask and is provided with a clamping space. Edges of the pellicle are fixed in the clamping space.