Photomask Reduced Reflection Layer UV Curing Efficiency
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Solution Overview
Problem
Conventional photo-masks used in LCD manufacturing reflect UV light, necessitating increased irradiation time or intensity during the curing process of sealants, which affects the efficiency and yield of the process.
Innovation Solution
A photo-mask comprising a substrate with a shading pattern layer, a protecting layer with a higher refractive index than the reduced reflection layer, and a reduced reflection layer made of silica, silicon nitride, or organic photo-resist material, where the thickness of the reduced reflection layer is optimized to minimize light reflection, thereby enhancing light transmittance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of energy
If a conventional photo-mask substrate is used, then the photo-mask structure is simple, but light reflection occurs during UV curing process
Solution Approach 1:
The patent applies composite materials by stacking multiple layers with different refractive indices (protecting layer with higher refractive index and reduced reflection layer with lower refractive index) on the substrate. This composite structure reduces light reflection through optical interference effects while maintaining the functional integrity of the photo-mask.
Solution Approach 2:
The patent changes the refractive index parameter by selecting materials with specific refractive index relationships (protecting layer n1 > reduced reflection layer n2). It also optimizes the thickness parameter of the reduced reflection layer to satisfy nd=λ/4, where λ is the UV light wavelength, thereby minimizing reflection through constructive interference.
2Reliability
If UV light intensity or irradiation time is increased to compensate for reflection, then curing effectiveness is improved, but process efficiency decreases
Solution Approach 1:
The patent converts the harmful reflection effect into a beneficial one by using the same optical interference principle to reduce reflection. The reduced reflection layer, with its specific refractive index and thickness (nd=λ/4), creates destructive interference for reflected light, thereby converting what was previously a loss into an advantage that improves light transmission and curing efficiency.
3Illumination intensity
If a reduced reflection layer with lower refractive index is added, then light transmittance is improved, but manufacturing complexity increases
Solution Approach 1:
The patent segments the photo-mask structure into distinct functional layers: substrate, shading pattern layer, protecting layer, and reduced reflection layer. Each layer serves a specific function and can be manufactured and optimized independently, making the overall manufacturing process more manageable despite the increased number of layers.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution reduces light reflection on the substrate, improving the utilization of light rays without increasing irradiation time or intensity, thus reducing curing time for the sealant and enhancing process efficiency and yield.
Implementation Method 1
a reduced reflection layer formed on the protecting layer, and a refractive index of the protecting layer is greater than a refractive index of the reduced reflection layer
Implementation Method 2
a refractive index of the protecting layer is greater than a refractive index of the reduced reflection layer
Data Source
AI summary
The present invention provides a photo-mask and a method for manufacturing the same. The method for manufacturing the photo-mask comprising: forming a shading pattern layer on a substrate; forming a protecting layer covering the shading pattern layer and the substrate; and; forming a reduced reflection layer on the protecting layer, wherein a refractive index of the protecting layer is greater than a refractive index of the reduced reflection layer. The present invention can mitigate a light reflection problem of a substrate of the conventional photo-mask.