Independent Temperature Pressure Control for Photomask Stud Attachment
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Solution Overview
Problem
Existing EUV lithography processes face challenges with device pattern uniformity and registration errors due to the shadow effect caused by applying the same temperature and pressure to attachment portions of the pellicle frame during photomask attachment, which affects the precision of micropattern formation in photolithography.
Innovation Solution
A stud attachment device and method that independently control temperature and pressure at attachment positions, using a device with holders, pressure regulators, and temperature regulators to attach studs to a photomask, allowing for precise coupling of the photomask and pellicle, minimizing registration errors.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If the same temperature and pressure are applied to all attachment portions of the pellicle frame, then the attachment process is simple and uniform, but registration errors occur in the photomask
Solution Approach 1:
The attachment device divides the pellicle frame into multiple attachment portions, each equipped with independent temperature and pressure regulators. This segmentation allows different regions to be controlled independently, resolving the contradiction between simple uniform attachment and precise registration control.
Solution Approach 2:
Different attachment portions of the pellicle frame are assigned different temperature and pressure conditions according to their specific registration requirements. Each attachment portion receives customized local control parameters, enabling precise registration while maintaining operational simplicity through automated local adjustment.
2Manufacturing precision
If independent temperature and pressure control is implemented for each attachment portion, then registration errors are reduced, but the device complexity increases
Solution Approach 1:
The attachment device uses universal multi-functional regulators that can independently control both temperature and pressure for each attachment portion. This multi-functionality reduces the need for separate control mechanisms, thereby limiting the increase in device complexity while achieving precise registration control.
Solution Approach 2:
The system controls registration precision by dynamically adjusting temperature and pressure parameters for each attachment portion. By using parameter changes rather than structural modifications, the device achieves high registration accuracy with minimal increase in overall system complexity.
3Reliability
If multiple regulators are used for temperature and pressure control, then the lithography performance is improved, but the cost of the device increases
Solution Approach 1:
The device merges temperature and pressure control functions into integrated regulators for each attachment portion. By combining multiple control functions into unified regulators, the system improves lithography performance through precise control while minimizing the total number of separate components, thereby limiting cost increase.
Data Source
AI summary
A stud attachment device for attaching a plurality of studs to a photomask constituting a reticle. The stud attachment device including a body; a plurality of holders extending from the body, the holders allowing the studs to be laid thereon, respectively; and a pressure regulator for independently controlling pressures of the holders when the studs are attached to the photomask.