Photomask with Wavelength-Selective Filter Layers

Solution Overview

Problem

Conventional photolithography techniques require multiple photomasks to form different pattern layers, which is inefficient and time-consuming as integration density increases in display devices.

Innovation Solution

A photomask with multiple filter layers that selectively transmit different wavelengths of light, allowing a single photomask to form various patterns by overlapping and separating filter layers to control light transmission, enabling the formation of distinct patterns using a single mask.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If multiple photomasks are used to form different pattern layers, then the required patterns can be formed, but the number of masks and process time increase

Engineering Contradiction:

Improvepattern formation accuracyVSAvoidprocess time

Core Design Contradiction:

Manufacturing precisionVSLoss of time

Solution Approach 1:

The photomask is designed with multiple filter layers that can selectively transmit different wavelengths of light, enabling a single mask to perform multiple patterning functions that previously required separate masks for each wavelength

Inventive Principle:

Principle #6Universality (Multi-functionality)

Solution Approach 2:

Multiple filter layers with different wavelength selectivity are combined into a single photomask structure, allowing simultaneous or sequential use of different wavelength lights through the same mask to form various patterns

Inventive Principle:

Principle #5Merging (Combining)

2Manufacturing precision

If multiple photomasks are used to form different pattern layers, then the required patterns can be formed, but the device complexity increases

Engineering Contradiction:

Improvepattern formation accuracyVSAvoidmask quantity

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The photomask is designed with multiple filter layers that can selectively transmit different wavelengths of light, enabling a single mask to perform multiple patterning functions that previously required separate masks for each wavelength

Inventive Principle:

Principle #6Universality (Multi-functionality)

Solution Approach 2:

Multiple filter layers with different wavelength selectivity are combined into a single photomask structure, allowing simultaneous or sequential use of different wavelength lights through the same mask to form various patterns

Inventive Principle:

Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables the formation of different patterns depending on light wavelength using a single photomask, reducing the number of masks needed and the time required to create fine patterns in photolithography processes.

Implementation Method 1

a first filter layer, which selectively transmits first-wavelength light therethrough

Methodology Applied

Scientific EffectSelective light transmission: Filter (optical)

Implementation Method 2

a second filter layer, which selectively transmits second-wavelength light therethrough

Methodology Applied

Scientific EffectSelective light transmission: Filter (optical)

Implementation Method 3

a plurality of filter layers disposed on the transparent substrate, wherein the filter layers include a first filter layer, which selectively transmits first-wavelength light therethrough, and a second filter layer, which selectively transmits second-wavelength light therethrough

Methodology Applied

Scientific EffectOptical filtering: Filter (optical)

Data Source

PatentUS10095103B2Photomask and method of forming fine pattern using the same

Publication Date: 2018.10.09 SAMSUNG DISPLAY CO LTD

AI summary

A photomask is provided. A photomask, comprising: a transparent substrate; and a plurality of filter layers disposed on the transparent substrate, wherein the filter layers include a first filter layer, which selectively transmits first-wavelength light therethrough, and a second filter layer, which selectively transmits second-wavelength light therethrough.