Photon Excitation Heating for Chemical Liquid Substrate Treatment
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Solution Overview
Problem
Conventional methods for heating chemical liquids in semiconductor fabrication processes using resistors lead to decreased yield due to particle generation, particularly when using isopropyl alcohol or deionized water for substrate cleaning.
Innovation Solution
An apparatus that heats chemical liquids using a photon excitation method, where a light source irradiates a heating element made of non-reactive materials like single-crystal silicon, silicon carbide, or silicon dioxide, which surrounds the flow path of the chemical liquid, ensuring efficient heating without particle generation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If a resistor is used to heat the chemical liquid, then the chemical liquid can be heated, but particles are generated which decrease the yield
Solution Approach 1:
The patent replaces the conventional resistor-based heating system with a light source-based heating system. The light source emits light that is absorbed by the chemical liquid, converting optical energy directly into thermal energy without mechanical contact or resistance-based heating elements that generate particles. This substitution eliminates the source of particle contamination while maintaining effective heating capability.
Solution Approach 2:
The patent introduces an intermediary substance (light-absorbing chemical additive or the chemical liquid itself) that mediates the energy transfer from the light source to the chemical liquid. The intermediary absorbs the light energy and converts it to heat internally, preventing direct contact between heating elements and the chemical liquid, thereby avoiding particle generation from resistor degradation or contamination.
2Productivity
If conventional heating methods are used, then heating can be achieved, but yield decreases due to particle contamination
Solution Approach 1:
The patent replaces conventional mechanical/resistive heating systems with an optical heating system using light sources. This substitution eliminates particle generation from heating element degradation, maintaining high yield while achieving effective heating. The light-based system prevents contamination that would otherwise reduce fabrication reliability and productivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively increases semiconductor fabrication efficiency by preventing particle formation, maintaining high cleanliness, and providing a stable, high-reliability heating system with reduced thermal conductivity losses and minimized latent heat generation.
Implementation Method 1
the heating element is heated using photon excitation, and heats the chemical liquid
Data Source
AI summary
There are provided an apparatus for heating a chemical liquid that heats a chemical liquid using a heating element with a light source as a medium, and a system for treating a substrate with the apparatus. The apparatus for heating a chemical liquid includes: a flow path provided as a path through which a chemical liquid used to treat a substrate passes; a heating element disposed to surround at least a portion of the flow path; and a light source irradiating the heating element with light, wherein the heating element is heated using photon excitation, and heats the chemical liquid.