Aluminum Photoreceptor Support Crystal Orientation for Sharper Printing
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Solution Overview
Problem
Existing electrophotographic photosensitive members suffer from blurring of dots and lines due to potential unevenness caused by random distribution of crystal orientations in the aluminum support, leading to inconsistent electron flow.
Innovation Solution
The electrophotographic photosensitive member features a support with controlled crystal orientations, specifically {001} and {101} orientations accounting for 60% or more of the surface area, and {111} orientations limited to 10% or less, enhancing uniform electron flow and reducing potential unevenness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the aluminum support uses a conventional random distribution of crystal orientations, then the manufacturing process is simple, but the electron flow becomes uneven causing blurring of dots and lines
Solution Approach 1:
The patent changes the crystal orientation parameters of the aluminum support by controlling the ratio of specific crystal planes ({001} and/or {101} orientations ≥60%, {111} orientation ≤10%). This parameter control ensures uniform electron flow across the support surface, preventing potential unevenness that causes blurring in output images, thereby improving image quality without requiring complex additional structures
Solution Approach 2:
The patent applies local quality by creating specific regions with controlled crystal orientations in the aluminum support. By ensuring that areas facing the photosensitive layer have predominant {001} and/or101} orientations with minimal111} orientations), the support provides locally optimized electron flow characteristics where needed, preventing blurring while maintaining manufacturing feasibility
2Manufacturing precision
If the aluminum support has controlled crystal orientations to ensure uniform electron flow, then blurring is suppressed, but the manufacturing process becomes more complex
Solution Approach 1:
The patent modifies manufacturing parameters by specifying crystal orientation ratios ({001} and/or101} ≥60%,111} ≤10%) that can be achieved through controlled rolling and heat treatment processes. These parameter specifications enable precise control of electron flow characteristics to prevent dot and line blurring, while remaining compatible with conventional aluminum processing techniques
Solution Approach 2:
The patent applies preliminary action by pre-controlling the crystal orientation of the aluminum support during manufacturing before the electrophotographic process. By establishing the desired crystal structure in advance through controlled rolling and heat treatment, the support is prepared to ensure uniform electron flow and prevent blurring from the outset, eliminating the need for post-manufacturing corrections
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration significantly reduces blurring of dots and lines in output images by stabilizing electron flow, thereby improving image quality.
Implementation Method 1
the surface of the support comprises an Al crystal grain having (α) plane having <001> orientation of -15° or more and less than +15°, (β) plane having <101> orientation of -15° or more and less than +15°, and (γ) plane having <111> orientation of -15° or more and less than +15°
Data Source
Figure 1A~1C
Figure 2
Figure 3
AI summary
An electrophotographic photosensitive member having: a support with a cylindrical shape; and a photosensitive layer, in which the support has a surface formed of Al and/or an Al alloy, and the surface of the support includes Al crystal grains having (α) plane having {001} orientation of -15° or more and less than +15°, (β) plane having {101} orientation of -15° or more and less than +15°, and (γ) plane having {111} orientation of-15° or more and less than +15°, a ratio of an area occupied by Al crystal grains having (γ) to the total area of the surface of the support is 10% or less, and a ratio of an area occupied by any one of Al crystal grains having (α) and Al crystal grains having (β) is 60% or more.