Photoresist Delivery System with Inversion Control Valve
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Solution Overview
Problem
Current photolithography processes result in significant wastage of photoresist chemicals due to residual amounts left in bottles, especially when changing containers, leading to substantial costs in large-scale applications.
Innovation Solution
A photoresist delivery system featuring a control valve that allows the photoresist container to be inverted, ensuring all photoresist is used without residual wastage, coupled with a level monitor to alert for replacements and a loader to facilitate the inversion process, preventing spills and optimizing usage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If photoresist is supplied directly from a photoresist bottle to the photoresist pump, then the system is simple and inexpensive, but residual photoresist is wasted when the bottle is changed
Solution Approach 1:
The system is divided into two main segments: a photoresist reservoir (storage container) and a photoresist pump (dispensing device), connected by tubing. This segmentation allows the reservoir to be refilled without disturbing the pump, eliminating the need to change bottles frequently and reducing photoresist wastage while maintaining operational simplicity
Solution Approach 2:
A photoresist reservoir acts as an intermediary between the photoresist bottle and the photoresist pump. The reservoir receives photoresist from the bottle and supplies it to the pump, allowing the pump to operate continuously without air bubbles while the reservoir can be refilled separately, thus eliminating both complexity and wastage
2Reliability
If an automated delivery system with two photoresist bottles is used, then photoresist pump reliability is improved, but photoresist wastage increases due to residual amounts left in bottles
Solution Approach 1:
The photoresist container is inverted during the refill process, with the control valve preventing spills. This inversion allows complete consumption of photoresist from the bottle (down to the tip of the tubing) without leaving residual amounts, while the pump continues to receive undisturbed photoresist supply, thus eliminating wastage while maintaining reliability
Solution Approach 2:
The system changes the operational parameter of photoresist consumption from partial (leaving 200ml residual) to complete (consuming down to tubing tip). The control valve enables this parameter change by allowing the container to be inverted and emptied completely without spilling, thus eliminating wastage while the pump maintains reliable operation
3Loss of substance
If the photoresist container is inverted to use all photoresist, then photoresist wastage is reduced, but photoresist may spill during the inversion process
Solution Approach 1:
The control valve is placed in the closed position before the photoresist container is inverted. This preliminary action seals the container, preventing any photoresist from spilling during the inversion process. After inversion is complete, the valve is opened to allow photoresist flow, thus enabling complete consumption without wastage or spillage
Data Source
AI summary
A photoresist delivery system includes a photoresist pump, a photoresist reservoir coupled to the photoresist pump, and a photoresist container. A control valve is between the photoresist reservoir and the photoresist container and is movable from a closed position to an open position upon engagement of the photoresist container with the photoresist reservoir to replenish photoresist therein.