Photoresist Circulation Loop Layout for Lower Solvent Consumption
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Solution Overview
Problem
High photoresist consumption and particle generation due to idle periods in semiconductor manufacturing processes, leading to increased waste and manufacturing costs.
Innovation Solution
Implementing an extended recirculation loop with a relocated AMC control valve and a t-valve to minimize idle sections, reducing the need for interval dummy dispenses and enhancing circulation efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If photoresist is circulated through the pump system continuously to prevent particle generation, then defect control is improved, but photoresist consumption increases due to interval dummy dispenses
Solution Approach 1:
The patent divides the circulation system into two separate loops: a first circulation loop that recirculates photoresist through the pump system to maintain particle control, and a second circulation loop that recirculates solvent through the same pump system. This segmentation allows the system to maintain defect control while reducing photoresist consumption by using solvent for routine circulation and only using photoresist when actually needed for manufacturing operations.
Solution Approach 2:
The patent introduces solvent as an intermediary substance that can be circulated through the pump system instead of photoresist during idle periods. The solvent acts as a placeholder that maintains system circulation and prevents particle generation without consuming expensive photoresist material. The solvent is later replaced with photoresist when manufacturing operations resume.
2Stability of the object's composition
If the circulation path is extended to improve mixing and prevent crystallization, then solution stability is improved, but the idle section volume increases leading to more photoresist waste
Solution Approach 1:
The patent segments the circulation system into distinct loops with different functions. The first circulation loop uses a compact configuration that minimizes idle section volume while still providing adequate mixing to prevent crystallization. The second circulation loop handles solvent recirculation separately. This segmentation allows the system to maintain solution stability without requiring a large idle section volume that would increase photoresist waste.
Solution Approach 2:
The patent applies different circulation strategies to different parts of the system. The photoresist circulation loop is designed with minimal idle volume to reduce waste, while the solvent circulation loop can have a larger volume since it doesn't involve expensive photoresist. This local quality approach optimizes each circulation loop for its specific requirements rather than using a uniform design throughout.
Data Source
AI summary
A solution dispense system for a semiconductor manufacturing process includes a longer circulation loop in order to minimize the idle section from resist pump to dispense nozzle. A t-valve and control valve are disposed close to the nozzle in order to decrease the idle section and reduce material consumption.