Photoresist Pressure Adjustment Container for Bubble-Free Supply
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The existing photoresist supply systems experience head loss differences leading to negative pressure, which can generate micro bubbles and affect pump and process performances, particularly in high-viscosity photoresist applications.
Innovation Solution
A system with a pressure adjustment container and controller to manage the supply line pressure, using a separator to separate spaces and control the volume of these spaces with pressurized fluid, and an air bubble sensor to manage air bubbles, ensuring the line remains at positive pressure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Force
If the first tank is positioned at a higher location than the chemical liquid bottle to facilitate photoresist supply, then the photoresist can be supplied to the higher location, but negative pressure is generated in the supply line due to head loss difference, causing micro bubbles to form
Solution Approach 1:
A pressure adjustment container is introduced as an intermediary device between the chemical liquid bottle and the first tank. This container includes a first space for photoresist flow and a second space for pressurized fluid, separated by a separator. The pressurized fluid in the second space applies pressure to the photoresist in the first space, enabling the photoresist to flow upward to the higher location while maintaining positive pressure to prevent bubble formation.
Solution Approach 2:
The invention utilizes pneumatic pressure by introducing pressurized fluid into the second space of the pressure adjustment container. This pressurized fluid transmits pressure to the photoresist through the separator, enabling controlled flow of the high-viscosity photoresist against gravity while maintaining positive pressure throughout the supply line to eliminate negative pressure-induced bubbling.
2Ease of operation
If bubbles are generated when replacing the chemical liquid bottle, then bubbles flow into the trap tank and discharge with the photoresist, but this influences pump and process performances
Solution Approach 1:
The pressure adjustment container is designed with a drain line that can be opened to drain bubbles and excess photoresist from the first space back to the chemical liquid bottle or a collection point. This extraction mechanism removes harmful bubbles from the system during bottle replacement operations, preventing them from entering the pump and trap tank, thus protecting pump and process performance while maintaining ease of operation.
Solution Approach 2:
An air bubble sensor is installed in the supply line to detect the presence of bubbles. When bubbles are detected, the controller automatically opens the drain line to drain the bubbles and excess photoresist, then closes the drain line when bubbles are no longer present. This feedback control mechanism ensures continuous removal of bubbles during bottle replacement, protecting the pump and process from bubble-related damage while allowing easy bottle replacement.
3Reliability
If the supply line is maintained at positive pressure to prevent bubble generation, then bubble formation is minimized, but additional pressure control mechanisms and components are required
Solution Approach 1:
The pressure adjustment container combines multiple functions into a single integrated device: it serves as a pressure regulation chamber, a bubble separation chamber, and a flow control chamber. The first space handles photoresist flow while the second space contains pressurized fluid, with the separator between them serving multiple purposes including pressure transmission and bubble trapping. This merging reduces the need for separate pressure control components and simplifies the overall system while maintaining positive pressure to prevent bubbling.
Solution Approach 2:
The pressure adjustment container is designed as a multi-functional device that simultaneously: (1) regulates pressure of the high-viscosity photoresist, (2) enables upward flow to higher locations, (3) separates and traps bubbles, (4) controls flow rate through the separator interface, and (5) provides a drain function for bubble removal. This multi-functionality reduces the number of separate components needed, managing device complexity while ensuring reliable bubble-free photoresist supply.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Minimizes bubble generation and resolves negative pressure issues, effectively managing high-viscosity photoresist supply by maintaining the supply line at positive pressure and removing air bubbles.
Implementation Method 1
a pressurized fluid inflow port supplying a pressurized fluid to the second space, and a volume of the first space varies depending on the supply of the pressurized fluid
Data Source
AI summary
Provided is a system for supplying a photoresist. In an embodiment, a system for supplying a photoresist includes a pressure adjustment container provided to a supply line connected from a chemical liquid bottle to a first tank, and the pressure adjustment container includes a housing having a space formed therein, a separator separating the space of the housing into a first space and a second space, an inflow port making a photoresist flow in the first space, a discharge port discharging the photoresist from the first space, and a pressurized fluid inflow port supplying a pressurized fluid to the second space, and a volume of the first space varies depending on the supply of the pressurized fluid.