Photosensitive Coloring Composition for Fine Pattern Formation
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Solution Overview
Problem
The demand for color filters with improved solvent resistance and the ability to form fine patterns has increased with the transition to organic EL light emitting sources and image sensors, as existing techniques face challenges in low-temperature manufacturing and sensitivity control.
Innovation Solution
A photosensitive coloring composition is developed, comprising a polymerization initiator with specific absorption coefficients, an alkali-soluble resin, and a coloring material, including compounds like C.I. Pigment Red, Green, and Blue, which allows for favorable solvent resistance and fine pattern formation through controlled exposure and development processes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If low-temperature manufacturing (approximately 100°C) is used, then manufacturing cost is reduced and organic EL compatibility is improved, but solvent resistance deteriorates
Solution Approach 1:
The patent changes the chemical parameters of the photosensitive composition by selecting specific polymerization initiators with defined absorption coefficients at 365 nm and 254 nm, along with specific coloring materials and alkali-soluble resins. This parameter optimization enables effective curing at low temperatures (around 100°C) while maintaining solvent resistance, resolving the contradiction between manufacturing temperature and reliability.
Solution Approach 2:
The patent employs a composite photosensitive composition containing multiple components: polymerization initiators (a) and (b) with specific absorption characteristics, coloring materials (e), and alkali-soluble resins (d). This composite formulation synergistically achieves both low-temperature processability and solvent resistance, addressing the technical contradiction through material composition optimization.
2Productivity
If high sensitivity polymerization initiators are used, then curing efficiency is improved, but fine pattern formation (1.0 μm) becomes difficult
Solution Approach 1:
The patent segments the polymerization initiation function into two distinct components: initiator (a) with high absorption coefficient at 365 nm for efficient curing, and initiator (b) with high absorption coefficient at 254 nm for fine pattern formation. This segmentation allows each initiator to optimize its function, resolving the contradiction between curing efficiency and pattern precision.
Solution Approach 2:
The patent optimizes the absorption coefficient parameters of the polymerization initiators at specific wavelengths (365 nm and 254 nm) to achieve both high curing efficiency and fine pattern formation capability. By controlling these optical parameters, the patent resolves the contradiction between productivity and manufacturing precision.
3Reliability
If post-baking at approximately 210°C is used, then solvent resistance is improved, but manufacturing complexity and energy consumption increase
Solution Approach 1:
The patent incorporates polymerization initiators with specific absorption characteristics that enable pre-curing at low temperatures before final exposure. This preliminary action at approximately 100°C prepares the composition for subsequent fine pattern formation, eliminating the need for high-temperature post-baking at 210°C and reducing process complexity.
Solution Approach 2:
The patent replaces the thermal curing mechanism (high-temperature post-baking) with a photochemical curing mechanism using dual-wavelength polymerization initiators. This substitution allows curing to occur at lower temperatures through light activation, reducing energy consumption and process complexity while maintaining solvent resistance.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves enhanced solvent resistance and precise pattern formation, enabling the production of high-quality color filters suitable for organic EL liquid crystal display devices and solid-state imaging elements.
Implementation Method 1
a polymerization initiator (a) with an absorption coefficient at 365 nm in methanol of 1.0×103 mL/gcm or more
Implementation Method 2
absorption coefficient at 365 nm in methanol of 1.0×103 mL/gcm or more
Implementation Method 3
a polymerization initiator (b) with an absorption coefficient at 365 nm in methanol of 1.0×102 mL/gcm or less and an absorption coefficient at 254 nm in methanol of 1.0×103 mL/gcm or more
Implementation Method 4
absorption coefficient at 254 nm in methanol of 1.0×103 mL/gcm or more
Implementation Method 5
an alkali-soluble resin (d)
Data Source
AI summary
Provided is a photosensitive coloring composition of the present invention including a polymerization initiator (a) with an absorption coefficient at 365 nm in methanol of 1.0×103 mL/gcm or more, a polymerization initiator (b) with an absorption coefficient at 365 nm in methanol of 1.0×102 mL/gcm or less and an absorption coefficient at 254 nm in methanol of 1.0×103 mL/gcm or more, a compound (c) which has an unsaturated double bond, an alkali-soluble resin (d), and a coloring material (e), in which, in the total solid content of the photosensitive coloring composition, the content of the polymerization initiator (a) is 1.5 mass % to 10 mass % and the content of the polymerization initiator (b) is 1.5 mass % to 7.5 mass %.