Photosensitive Composition for High Resolution 365 nm Patterning

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Solution Overview

Problem

Current photosensitive compositions used in forming patterns for display devices with touch panels, such as capacitive input devices, face limitations in achieving high resolution and low dielectricity, particularly when exposed to light with a wavelength of 365 nm.

Innovation Solution

A photosensitive composition comprising a compound A with a carboxy group and compound B having a molar absorption coefficient of 365 nm exceeding 1,000 (cm·mol/L), where the carboxy group content is reduced by actinic ray irradiation, with compound B having a maximal absorption wavelength between 300 to 400 nm and capable of accepting electrons from compound A in a photoexcited state, enhancing pattern resolution and low dielectricity.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If conventional photosensitive compositions are used for pattern formation, then the pattern can be formed, but the resolution is insufficient and the dielectric constant is high

Engineering Contradiction:
Improvepattern resolutionVSAvoiddielectric constant
Core Design Contradiction:
Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

The patent changes the chemical composition parameters of the photosensitive material by incorporating compound A (with carboxy groups that reduce upon exposure) and compound B (with high molar absorption coefficient at 365 nm). This parameter change enables both high resolution patterning and low dielectric constant properties simultaneously

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent creates a composite photosensitive composition containing multiple functional components: compound A (providing carboxy groups for resolution enhancement), compound B (providing high light absorption at 365 nm), and optionally compound C (providing additional photosensitivity). This composite structure achieves both high resolution and low dielectric constant

Inventive Principle:
Principle #40Composite materials

2Manufacturing precision

If exposure to 365 nm light is applied, then pattern formation is enabled, but the carboxy group content reduction is insufficient

Engineering Contradiction:
Improvepattern formabilityVSAvoidcarboxy group content
Core Design Contradiction:
Manufacturing precisionVSQuantity of substance

Solution Approach 1:

The patent incorporates compound B with high molar absorption coefficient at 365 nm into the photosensitive composition before exposure. This preliminary inclusion of the light-absorbing compound enables efficient carboxy group reduction upon exposure to 365 nm light, achieving both good pattern formability and sufficient carboxy group content reduction

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent optimizes the absorption characteristics of the photosensitive composition by selecting compound B with maximal absorption wavelength between 300-400 nm and molar absorption coefficient greater than 1,000 (cm·mol/L)−1 at 365 nm. This parameter optimization ensures efficient photochemical reaction and carboxy group reduction

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The composition achieves excellent resolution and low dielectricity in patterns formed under 365 nm light exposure, improving the manufacturing of circuit wiring and touch panels by reducing the carboxy group content, thereby enhancing pattern formability and dielectric properties.

Implementation Method 1

compound B having a molar absorption coefficient at a wavelength of 365 nm of more than 1,000 (cm·mol/L)−1 and capable of accepting electrons from the carboxy group included in compound A in a photoexcited state

Methodology Applied
Scientific EffectPhotoexcitation: Photoelectric Effect

Implementation Method 2

a content of the carboxy group is reduced by irradiation with an actinic ray or a radiation

Methodology Applied
Scientific EffectPhotodecarboxylation: Photodissociation

Data Source

PatentUS20240210828A1Photosensitive composition, transfer film, pattern forming method, method for manufacturing circuit wiring, and method for manufacturing touch panel
Publication Date: 2024.06.27 FUJIFILM CORP
  • US20240210828A1 patent drawing
  • US20240210828A1 patent drawing
  • US20240210828A1 patent drawing

AI summary

An object of the present invention is to provide a photosensitive composition which has excellent resolution, and has excellent low dielectricity of a pattern to be formed in a case of being exposed to irradiation light including light having a wavelength of 365 nm. Another object of the present invention is to provide a transfer film, a pattern forming method, a method for manufacturing a circuit wiring, and a method for manufacturing a touch panel.The photosensitive composition of the present invention contains a compound A having a carboxy group anda compound B having a molar absorption coefficient at a wavelength of 365 nm of more than 1,000 (cm·mol/L)−1,in which a content of the carboxy group is reduced by irradiation with an actinic ray or a radiation.