Photosensitive Composition for Color Filter Partition Walls

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Solution Overview

Problem

Existing photosensitive compositions for forming partition walls in color filters and organic EL devices often fail to achieve optimal ink repellency on the surface while ensuring ink affinity in open areas, leading to issues like color mixing and edge leakage.

Innovation Solution

A photosensitive composition comprising a polymer with specific fluoroalkyl side chains, a black colorant, a photopolymerization initiator, and a photosensitive resin with acidic groups, which provides a molecular weight range and fluorine content that enables good ink repellency on the surface and ink affinity in open areas, preventing color mixing and edge leakage.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If the molecular weight of the fluoropolymer is increased to improve ink repellency, then ink repellency is improved, but the composition complexity increases

Engineering Contradiction:
Improveink repellencyVSAvoidcomposition complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent specifies precise molecular weight ranges (number average: 2×10^4 to 7×10^4, weight average: 5×10^4 to 25×10^4) and fluorine content (5-35 mass %) to achieve optimal ink repellency while maintaining composition manageability and avoiding excessive complexity.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The composition effectively forms partition walls with superior ink repellency on the surface and ink affinity in open areas, preventing color mixing and edge leakage, thus enhancing the performance of color filters and organic EL devices.

Implementation Method 1

a photopolymerization initiator (C)

Methodology Applied
Scientific EffectPhotopolymerization: Photopolymerisation

Data Source

PatentUS8168354B2Photosensitive composition, partition walls, color filter and organic EL device
Publication Date: 2012.05.01 AGC INC
  • US8168354B2 patent drawing
  • US8168354B2 patent drawing
  • US8168354B2 patent drawing

AI summary

It is an object of the present invention to provide a photosensitive composition capable of forming partition walls having an upper surface with good ink repellency and open areas which have good ink affinity within which an ink will easily spread. Further, it is an object of the present invention to provide partition walls formed by curing the photosensitive composition, and a color filter and an organic EL device having the partition walls.The photosensitive composition is a photosensitive composition, which comprises a polymer (A) having a side chain containing a group represented by the formula:—CFXRf  (1)or a group represented by the formula:and a side chain containing an ethylenic double bond, a black colorant (B), a photopolymerization initiator (C), and a photosensitive resin (D) containing an acidic group and an ethylenic double bond, wherein the polymer (A) has a number average molecular weight of at least 2×104 and at most 7×104 and a weight average molecular weight of at least 5×104 and at most 25×104.