Photosensitive Composition for Ultrafine Pattern Resolution

The patent changes the chemical parameters of the photosensitive composition by introducing a specific photobase generator (Formula I) with unique structural components (Y representing monovalent organic group, R1-R6 representing various organic groups including heteroaryl groups). This parameter change in the molecular structure enables simultaneous achievement of high sensitivity, good solvent resistance, and excellent pattern resolution in ultrafine patterning applications.

The patent creates a composite photosensitive composition combining the novel photobase generator (Formula I) with base-reactive compounds (epoxy resin, polyamic acid) and other components. This composite material approach integrates multiple functional properties: the photobase generator provides sensitivity and acid generation, while the base-reactive compounds provide thermal stability and solvent resistance, resolving the contradiction between pattern resolution and material reliability.

The patent optimizes the photobase generator structure (Formula I) to be highly responsive to shorter wavelength exposure light. The specific molecular parameters (Y, R1-R6 groups) are designed to absorb higher energy photons efficiently and generate sufficient base concentration, thereby maintaining high sensitivity even when using shorter wavelength exposure sources required for ultrafine patterning.

The photobase generator (Formula I) acts as an intermediary that converts exposure energy into base concentration efficiently. This intermediary substance bridges the gap between short-wavelength exposure light and the chemical reaction required for pattern formation, enabling high sensitivity and good reaction contrast to be achieved despite the use of higher energy, shorter wavelength light sources.

The patent modifies the chemical parameters of the photosensitive system to enhance base generation efficiency and distribution uniformity. The specific structure of Formula I (with Y, R1-R6 representing various organic groups including heteroaryl groups) is designed to produce sufficient base concentration even in ultrafine patterns, ensuring complete reaction and minimal residual film, thereby improving both pattern resolution and reducing residual film ratio simultaneously.

The patent employs a chemical amplification mechanism where the photobase generator (Formula I) produces base that catalyzes further reactions. This feedback loop amplifies the initial exposure signal, ensuring that even ultrafine patterns receive sufficient chemical transformation for complete development. The uniform acid generation and distribution mentioned in the patent enable consistent reaction throughout the film thickness, improving developability and reducing residual film across all pattern sizes.