Photosensitive Composition Testing via Dissolution Rate Comparison
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Solution Overview
Problem
Current methods for testing photosensitive compositions are complex and inefficient in determining whether a newly produced photosensitive composition exhibits similar Line Width Roughness (LWR) performance to previous production lots, requiring the formation of resist patterns and measurement of line width roughness.
Innovation Solution
A method involving the use of a reference photosensitive composition and a treatment liquid with specific components to form and measure resist films, allowing for comparison of dissolution rates to determine if the new composition meets predetermined LWR standards, including the use of a reference photosensitive composition with an acid decomposable resin and a photoacid generator, and a treatment liquid containing aromatic hydrocarbons, aliphatic hydrocarbons, and metals like Al, Fe, or Ni.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If resist patterns are formed and line width roughness is measured to determine performance consistency, then measurement precision is improved, but device complexity and time consumption increase
Solution Approach 1:
The patent extracts the essential performance characteristic (d dissolution rate) from the complex LWR measurement process. By measuring only the dissolution rate of the resist film in a specific treatment liquid containing aromatic hydrocarbons and metal ions, the method obtains sufficient performance comparison data without requiring full LWR measurement, thereby simplifying the testing process while maintaining measurement effectiveness
Solution Approach 2:
The patent creates a simplified test model that copies only the necessary aspect of LWR performance. Instead of measuring actual line width roughness, it uses dissolution rate as a proxy indicator that correlates with LWR performance, enabling performance comparison through a simpler, faster measurement that avoids the complexity of pattern formation and direct LWR measurement
2Measurement precision
If resist patterns are formed to test photosensitive composition performance, then measurement accuracy is improved, but productivity decreases
Solution Approach 1:
The patent extracts the critical performance indicator (d dissolution rate) from the complete LWR measurement workflow. By focusing solely on measuring dissolution rate in a specially formulated treatment liquid, it eliminates time-consuming steps such as pattern formation, development, and direct LWR measurement, thereby significantly improving testing efficiency while retaining the ability to assess performance consistency
Solution Approach 2:
The patent performs preliminary characterization of the treatment liquid composition (aromatic hydrocarbons with metal ions Al, Fe, or Ni) and establishes the correlation between dissolution rate and LWR performance in advance. This preliminary work enables subsequent rapid testing without requiring full LWR measurement procedures, thus improving productivity while maintaining measurement precision
Data Source
AI summary
Provided are a method for testing a photosensitive composition and a method for producing a photosensitive composition that can easily test whether or not the photosensitive composition exhibits a predetermined LWR. A method for testing a photosensitive composition according to the present invention has a step 1 of using a reference photosensitive composition to form a resist film, bringing the resist film into contact with a treatment liquid, and measuring a dissolution rate of the resist film to obtain reference data; a step 2 of using a photosensitive composition for measurement to form a resist film, bringing the resist film into contact with a treatment liquid, and measuring a dissolution rate of the resist film to obtain measurement data; and a step 3 of performing comparison between the reference data and the measurement data to determine whether or not an allowable range is satisfied, wherein the treatment liquid includes an organic solvent and a metal X, the organic solvent does not include an aromatic hydrocarbon and includes an aliphatic hydrocarbon, and a mass ratio of a content of the aromatic hydrocarbon to a content of the metal X is 5.0×102 to 5.0×1012.