Positive Photosensitive Composition for Thin Film Transistor Insulation
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Solution Overview
Problem
Current positive photosensitive compositions used in displays and semiconductors lack sufficient insulation properties when cured as thin films, failing to meet the requirements for insulating films.
Innovation Solution
A positive photosensitive composition comprising a compound with an alkenyl or SiH group that decomposes to generate acidic or hydroxyl groups, combined with a hydrosilylation catalyst and a photoacid generator, to achieve excellent patterning and electrical insulation reliability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional positive photosensitive compositions (acrylic or phenolic resins) are used, then patterning properties are achieved, but insulation properties of cured thin films are insufficient
Solution Approach 1:
The patent combines multiple resin components (polymerizable compound, curable compound, and optional third resin) with specific functional groups to create a composite photosensitive composition. This composite structure enables simultaneous achievement of excellent patterning properties through photoacid generator interaction and superior insulation properties through the cured film's molecular structure, resolving the contradiction between patterning performance and insulation reliability
2Duration of action of stationary object
If polysiloxane compounds are used for curable photosensitive compositions, then curability is improved, but insulation properties of cured products are still insufficient
Solution Approach 1:
The curable compound in the patent is designed with multi-functionality: it contains polymerizable unsaturated bonds for curability, specific functional groups for durability, and molecular structure features for insulation properties. This universal compound performs multiple functions simultaneously, resolving the contradiction between achieving curability and maintaining insulation performance
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition exhibits excellent patterning properties and electrical insulation reliability when cured, suitable for use in thin film transistors as gate insulators or passivation films, enhancing transistor performance and reliability.
Implementation Method 1
a positive photosensitive composition... comprises a compound (A) that contains an alkenyl group or a SiH group within a molecule and has a structure that decomposes in the presence of acid to generate an acidic group or a hydroxyl group; (D) a photoacid generator
Implementation Method 2
a compound (B) that contains a SiH group or an alkenyl group within a molecule; (C) a hydrosilylation catalyst
Data Source
Figure 1~2
AI summary
The present invention aims to provide positive photosensitive compositions that have excellent patterning properties and can exhibit excellent electrical insulation reliability when cured (as thin films). The positive photosensitive composition according to the present invention is characterized by including (G) a compound having a structure represented by formula (X1) or (X2); (H) a compound having a structure that decomposes in the presence of acid to generate an acidic group or a hydroxyl group; and (D) a photoacid generator, the formulas (X1) and (X2) respectively being: