Photosensitive Core-Shell Nano-Particles for Semiconductor Etching

The patent uses composite core-shell type nano-particles consisting of a metal oxide core (providing etching resistance) and an organic shell layer (providing storage and coating stability). This composite structure allows simultaneous achievement of high etching resistance and excellent stability by combining materials with complementary properties.

The patent applies a thin shell layer composed of unsaturated carboxylic acid or unsaturated carboxylate and silylated unsaturated carboxylic acid on the metal oxide core. This shell acts as a protective flexible coating that prevents molecular structure changes during storage while maintaining the underlying metal oxide's etching resistance.

The composite core-shell structure combines metal oxide core with organic shell materials that provide coating stability. The shell prevents post-coating delay dependency by stabilizing the resist solution composition, ensuring consistent coating properties regardless of storage time.

The organic shell acts as an intermediary layer between the metal oxide core and the surrounding environment. It mediates the interaction by preventing direct exposure of the metal oxide to conditions that would cause molecular structure changes, thereby ensuring coating stability while preserving etching resistance.

The patent creates a composite material where metal oxide particles (providing etching resistance) are embedded in a resist matrix and covered with stabilizing shell layers. This composite approach overcomes the limitation of conventional materials by integrating multiple functional components into a single system.

The patent applies local quality by providing different functional properties at different locations: the metal oxide core provides etching resistance at the particle center, while the organic shell provides storage and coating stability at the particle surface, allowing each region to optimize its specific function.