Photosensitive Composition LWR Testing via Reference Pattern Comparison
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Solution Overview
Problem
Current methods for testing photosensitive compositions are complex and inefficient in determining whether a newly produced photosensitive composition exhibits similar line width roughness (LWR) performance to previous production lots, particularly in semiconductor fabrication processes where ultrafine patterns are required.
Innovation Solution
A method involving the use of a reference photosensitive composition with a photoacid generator and acid-decomposable resin to form a resist film, followed by exposure and development, allowing for comparison with a measurement photosensitive composition using a developer containing specific solvents and metal atoms to determine if the LWR meets predetermined specifications.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a resist pattern is formed and LWR is measured to determine performance consistency, then measurement precision is improved, but device complexity and loss of time increase
Solution Approach 1:
The patent uses a reference photosensitive composition to create a reference resist pattern that serves as a template for comparison. Instead of performing complex LWR measurements on every production lot, the method creates a simplified reference copy that captures the essential performance characteristics, allowing for rapid visual or automated optical comparison of subsequent production lots against this reference.
Solution Approach 2:
The reference photosensitive composition is prepared in advance with known performance characteristics. This preliminary reference is established before production testing begins, so that subsequent production lots can be quickly compared against it without requiring full measurement procedures. The reference pattern is created once and then used repeatedly for quality control.
2Measurement precision
If a resist pattern is formed and LWR is measured to determine performance consistency, then measurement precision is improved, but loss of time increases
Solution Approach 1:
The reference photosensitive composition creates a reference pattern that replicates the essential features needed for quality assessment. This reference copy allows for rapid comparison of production lots without repeating the time-consuming full measurement process, significantly reducing testing time while maintaining adequate quality control.
Solution Approach 2:
The reference pattern is prepared in advance before production testing. This preliminary preparation means that when production lots need testing, the comparison can be done quickly against the pre-established reference, eliminating the need to perform full measurements each time and thus reducing loss of time.
3Reliability
If conventional testing methods are used to ensure performance consistency, then reliability is improved, but productivity decreases
Solution Approach 1:
The reference photosensitive composition provides a reliable template that captures the essential performance characteristics. By comparing production lots against this reference copy rather than performing full measurements, the system maintains reliability through consistent reference comparison while enabling faster throughput by simplifying the testing procedure for each production lot.
Solution Approach 2:
The reference pattern is established in advance with verified performance characteristics. This preliminary action ensures reliability is maintained because the reference is created once under controlled conditions, while productivity increases because subsequent production lots can be quickly compared against this pre-validated reference without repeating the full testing process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method simplifies the testing process by ensuring that the photosensitive composition consistently meets predetermined LWR standards, reducing fluctuations in pattern size and LWR performance across production lots.
Implementation Method 1
a photoacid generator and an acid decomposable resin having a group that is decomposed by the action of an acid to generate a polar group
Data Source
AI summary
The present invention provides a method for testing a photosensitive composition and a method for producing a photosensitive composition that can easily test whether or not the photosensitive composition exhibits a predetermined LWR. The method for testing a photosensitive composition has a step 1 of using a reference photosensitive composition including an acid decomposable resin having a group that is decomposed by an action of an acid to generate a polar group and a photoacid generator, to form a resist film on a substrate, exposing the resist film, using a developer to perform a development treatment to form a resist pattern, and obtaining any one reference data selected from the group consisting of a line width or a space width of a line-shaped resist pattern, an opening diameter of an opening portion in the resist pattern, and a dot diameter of a dot-like resist pattern; a step 2 of using a photosensitive composition for measurement including components of the same types as types of components included in the reference photosensitive composition, to form a resist film on a substrate, exposing the resist film, using a developer to perform a development treatment to form a resist pattern, and obtaining measurement data of the resist pattern; and a step 3 of performing comparison between the reference data and the measurement data to determine whether or not an allowable range is satisfied, wherein the developer is an organic solvent-based developer including an aliphatic hydrocarbon solvent, an aromatic hydrocarbon, and at least one metal atom selected from the group consisting of Al, Fe, and Ni, and a mass ratio of a content of the aromatic hydrocarbon to a content of the metal atom in the developer is 5.0×104 to 2.0×1010.