Electrophotographic Photosensitive Member Copolymer Composition
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Solution Overview
Problem
Electrophotographic photosensitive members face issues with deep scratches and insufficient abrasion resistance under low temperature and low humidity environments, as existing solutions like triarylamine compounds with multiple methacryloyloxy groups either cause deep scratches or lack sufficient abrasion resistance.
Innovation Solution
A surface layer comprising a copolymer of specific compounds represented by general formulas (1) and (2), with a compound content ratio of 25-70 mass% and total content of 55 mass% or more, which increases film density to dissipate external stress as heat, reducing the occurrence of deep scratches and enhancing abrasion resistance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If a radical polymerizable resin is used for the surface layer to improve abrasion resistance, then abrasion resistance is improved, but deep scratches and image defects occur due to foreign matters
Solution Approach 1:
The invention changes the chemical composition parameters of the surface layer by using a copolymer consisting of a triarylamine compound with one methacryloyloxy group and a triarylamine compound with two acryloyloxy groups. This specific compositional parameter change maintains abrasion resistance while reducing the hardness that causes deep scratches.
Solution Approach 2:
The surface layer uses a composite material approach by combining two different triarylamine compounds with different functional groups (methacryloyloxy and acryloyloxy). This composite structure balances the properties of both components to achieve both abrasion resistance and scratch resistance.
2Strength
If a triarylamine compound with four or more methacryloyloxy groups is used, then abrasion resistance is improved, but deep scratches occur due to excessive hardness
Solution Approach 1:
The invention changes the parameter of methacryloyloxy group content by using compounds with one or two such groups instead of four or more. This parameter adjustment reduces the excessive hardness while maintaining sufficient abrasion resistance.
Solution Approach 2:
The invention applies local quality by having different triarylamine compounds with different functional group configurations in specific proportions (25-70 mass% of the compound with one methacryloyloxy group). This creates local variation in properties within the surface layer to balance hardness and abrasion resistance.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed configuration effectively suppresses deep scratches and improves abrasion resistance in electrophotographic photosensitive members, even under low temperature and low humidity conditions, by creating a dense film network that dissipates external stress and reduces foreign matter adhesion.
Implementation Method 1
a surface layer, in which the surface layer contains a copolymer of a composition which contains at least a compound represented by the following general formula (1) and a compound represented by the following general formula (2)... increases film density to dissipate external stress as heat
Data Source
AI summary
An electrophotographic photosensitive member includes a support and a surface layer, in which the surface layer contains a copolymer of a composition which contains at least a compound represented by the following general formula (1) and a compound represented by the following general formula (2), a content of the compound represented by the general formula (1) in the composition is 25 mass% or more and 70 mass% or less with respect to a total content of the compound represented by the general formula (1) and the compound represented by the general formula (2), and the total content of the compound represented by the general formula (1) and the compound represented by the general formula (2) is 55 mass% or more with respect to a total mass of the composition.