Photosensitive Surface Treatment Agent for Direct Metal Patterning

Resolve Bottlenecks,
Find Innovative SolutionsGenerate Solutions

Solution Overview

Problem

Existing methods for forming patterns with different surface properties on substrates in microdevice manufacturing are inefficient and require additional steps like chemical resist removal and catalyst activation, leading to increased complexity and cost.

Innovation Solution

A compound represented by General Formula (M1) with a dinitrobenzyl group is used to generate amines upon irradiation, allowing direct adhesion of metal, organic, or inorganic materials without the need for chemical resist or catalyst activation, through a photosensitive surface treatment agent and electroless plating process.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If conventional methods using chemical resist and catalyst activation are used for pattern formation, then metal materials can adhere to the substrate, but the process complexity and manufacturing cost increase

Engineering Contradiction:

Improveadhesion of metal materialVSAvoidprocess complexity

Core Design Contradiction:

ReliabilityVSDevice complexity

Solution Approach 1:

The invention extracts and eliminates the chemical resist and catalyst activation steps from the conventional pattern formation process. By using a photosensitive surface treatment agent that directly generates chemically active substituents upon light irradiation, the method removes unnecessary intermediate steps while maintaining reliable metal material adhesion to the substrate

Inventive Principle:

Principle #2Taking out (Extraction)

Solution Approach 2:

The invention merges the functions of the photosensitive surface treatment agent to simultaneously achieve pattern formation and surface activation. The single agent performs both the photopatterning function and the catalyst activation function that were previously separate steps, thereby simplifying the overall process while ensuring reliable metal adhesion

Inventive Principle:

Principle #5Merging (Combining)

2Reliability

If conventional methods with multiple steps are used for pattern formation, then metal films can be formed, but the manufacturing time and cost increase

Engineering Contradiction:

Improvemetal film formationVSAvoidmanufacturing time

Core Design Contradiction:

ReliabilityVSLoss of time

Solution Approach 1:

The invention applies preliminary action by pre-equipping the surface treatment agent with both the photosensitive functionality and the metal adhesion promotion functionality. This allows the agent to be ready for direct metal deposition after a single light irradiation step, eliminating the need for sequential catalyst activation and resist removal steps, thereby reducing manufacturing time while ensuring reliable metal film formation

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The photosensitive surface treatment agent serves multiple functions: it acts as a photomask, generates chemically active substituents for metal adhesion, and eliminates the need for separate catalyst activation and resist removal steps. This multi-functionality reduces the overall manufacturing time while maintaining reliable metal film formation

Inventive Principle:

Principle #6Universality (Multi-functionality)

3Manufacturing precision

If additional steps like chemical resist removal and catalyst activation are added, then pattern precision can be achieved, but the manufacturing cost increases

Engineering Contradiction:

Improvepattern precisionVSAvoidmanufacturing cost

Core Design Contradiction:

Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The invention extracts and eliminates the costly chemical resist removal and catalyst activation steps from the manufacturing process. By using a photosensitive surface treatment agent that directly generates the necessary chemically active substituents upon light irradiation, the method maintains high pattern precision while significantly reducing manufacturing costs by removing these additional processing steps

Inventive Principle:

Principle #2Taking out (Extraction)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method enables high-precision patterning with reduced steps, cost, and time, while ensuring solubility and film formability, and is compatible with roll-to-roll processes.

Implementation Method 1

A compound represented by General Formula (M1) with a dinitrobenzyl group is used to generate amines upon irradiation

Methodology Applied

Scientific EffectPhotoirradiation-induced amine generation: Photodissociation

Implementation Method 2

Electroless plating is a technique for making a metal material adhere closely onto a substrate to form a metal film

Methodology Applied

Scientific EffectElectroless plating: Chemical Beam Epitaxy

Data Source

PatentUS20250386722A1Compound, polymer compound, photosensitive surface treatment agent, laminate, substrate for pattern formation, transistor, pattern formation method, and transistor manufacturing method

Publication Date: 2025.12.18 NIKON CORP

AI summary

A compound represented by General Formula (M1) below is provided. In Formula (M1), Y is a linear or branched alkyl group having 1 to 10 carbon atoms, a polymerizable group-containing group, or a group represented by [SiX3—Y11—*]. Y11 is a linear or branched alkylene group having 1 to 4 carbon atoms, X is a halogen atom or an alkoxy group, and * is a bonding site to an N atom. R1 is a hydrogen atom or a methyl group. R2 is a hydrogen atom or a alkyl group having 1 to 6 carbon atoms. R3 and R4 each independently represents a alkyl group having 1 to 3 carbon atoms or a fluoroalkyl group. n=2.