Photosensitive Paste Composition for Precise Wiring Pattern Formation
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Solution Overview
Problem
The formation of wiring patterns with oxime ester initiator-containing photosensitive pastes results in broad widths due to the spreading of active energy radiation, both parallel and perpendicular to the direction of irradiation, leading to inaccurate and unreliable wiring patterns.
Innovation Solution
A photosensitive paste comprising an inorganic powder, a photopolymerizable monomer, an alkali-soluble polymer, and an oxime ester initiator with a diphenyl sulfide group, which reduces the spread of active energy radiation perpendicular to the irradiation direction while enhancing curability in the direction of irradiation, allowing for precise control of the radiation penetration.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If an oxime ester initiator-containing photosensitive paste is used for wiring pattern formation, then the curability and polymerization efficiency are improved, but the width of the wiring pattern becomes broader than the photomask due to spreading of active energy radiation
Solution Approach 1:
The patent applies local quality by creating an asymmetric light absorption characteristic where the diphenyl sulfide group preferentially absorbs active energy radiation in the direction perpendicular to irradiation (Y-direction) while allowing radiation to pass in the irradiation direction (Z-direction). This directional selectivity enables different optical properties in different spatial directions, resolving the contradiction between maintaining curability and preventing lateral spread of the wiring pattern
Solution Approach 2:
The patent changes the chemical structure parameter of the photopolymerization initiator by introducing a diphenyl sulfide group into the oxime ester initiator. This structural modification fundamentally alters the light absorption characteristics, enabling the initiator to maintain polymerization efficiency while reducing lateral radiation spread. The parameter change transforms the initiator's optical properties to achieve both curability and precision
2Reliability
If active energy radiation is applied to cure the photosensitive paste, then the polymerization reaction is activated and curability is achieved, but the radiation spreads in directions perpendicular to irradiation causing wiring pattern expansion
Solution Approach 1:
The diphenyl sulfide group acts as an intermediary element within the photopolymerization initiator that mediates the interaction between active energy radiation and the polymerization reaction. It selectively absorbs and redirects radiation energy, allowing the radiation to effectively cure the paste in the irradiation direction while blocking lateral spread. This intermediary structure enables precise control over radiation propagation without compromising curability
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables the formation of wiring patterns with dimensions closer to the photomask specifications, resulting in high-accuracy inner wiring and improved performance and reliability of electronic components.
Implementation Method 1
an oxime ester initiator having a diphenyl sulfide group
Implementation Method 2
a photopolymerizable monomer
Implementation Method 3
By virtue of having this aspect, the present disclosure is able to provide a photosensitive paste with which while the spread of active energy radiation in the direction perpendicular to the direction of irradiation with the energy radiation can be reduced
Data Source
AI summary
A photosensitive paste contains an inorganic powder, a photopolymerizable monomer, an alkali-soluble polymer, and an oxime ester initiator having a diphenyl sulfide group.