Photosensitive Quantum Dot Composition for Pattern Quality

The patent introduces a compatibility modifier as an intermediary substance between quantum dots and photoresist. This modifier contains functional groups that interact with both quantum dots and photoresist components, mediating their interaction to prevent agglomeration while maintaining pattern formation capability. The compatibility modifier acts as a bridge that resolves the incompatibility between the two materials.

The patent modifies the chemical parameters of the photoresist system by incorporating compatibility modifiers with specific functional groups. This changes the chemical environment and interaction parameters, allowing quantum dots to disperse uniformly without agglomering. The parameter change transforms the incompatible system into a compatible one through chemical modification.

The patent applies local quality by using a multi-component photoinitiator system where different photoinitiators operate at different depths and rates. The surface-proximity photoinitiator cures the top layer quickly to prevent undercutting, while the deep-penetration photoinitiator continues curing deeper layers at a controlled rate. This spatial differentiation of curing characteristics allows both speed and quality.

The patent implements periodic action through sequential or staged exposure methods. The curing process occurs in phases: first a rapid initial cure to establish pattern structure, then a slower completion phase to finish curing without undercutting. This periodic approach to curing rate control enables both high productivity and high pattern quality.