Photosensitive Resin Composition Base Generator Sensitivity
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Solution Overview
Problem
Conventional photobase generators have low sensitivity, requiring high electromagnetic radiation doses, which decreases throughput and limits the utility of photosensitive resin compositions in patterning processes, especially when used with polyimide precursors that are highly soluble, leading to reduced contrast and process margin.
Innovation Solution
A base generator represented by a specific chemical formula that generates a base upon exposure to electromagnetic radiation and heating, enhancing sensitivity and allowing for broader compatibility with various polymer precursors, thereby increasing dissolution contrast and pattern quality.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional photobase generators are used, then the photosensitive resin composition can be formed, but the sensitivity is low requiring high electromagnetic radiation doses which decreases throughput
Solution Approach 1:
The patent changes the chemical structure parameters of the photobase generator by introducing specific substituents (electron-donating groups at positions 2 and 6 of the pyridine ring) to optimize its light absorption characteristics and base generation efficiency, thereby achieving high sensitivity at low radiation doses
Solution Approach 2:
The patent creates a composite photosensitive resin composition by combining the specifically structured photobase generator with polyimide precursor and solvent, where each component contributes unique properties that collectively achieve high sensitivity and good pattern formation
2Reliability
If high electromagnetic radiation doses are used to compensate for low sensitivity, then the photobase generator can function, but the throughput per unit time decreases
Solution Approach 1:
The patent optimizes the molecular structure parameters of the photobase generator to enhance its molar extinction coefficient and base generation quantum yield, allowing effective pattern formation at reduced exposure doses and shorter exposure times
3Manufacturing precision
If the added amount of photobase generator is increased to improve dissolution contrast, then the pattern contrast improves, but the characteristic properties of polyimide are not obtained
Solution Approach 1:
The patent changes the chemical parameters of the photobase generator structure (introducing electron-donating groups) to enhance its base generation efficiency, allowing effective dissolution contrast to be achieved at lower concentrations that preserve polyimide properties
Solution Approach 2:
The photobase generator acts as an intermediary that mediates between the polyimide precursor and the development process, generating bases in situ upon light exposure to promote cyclization and create dissolution contrast without requiring large amounts of additive
4Manufacturing precision
If conventional patterning methods are used, then patterns can be formed, but the process complexity increases due to requiring resist layers or specific precursor structures
Solution Approach 1:
The patent merges the photobase generator functionality directly into the photosensitive resin composition with the polyimide precursor, eliminating the need for separate resist layers or complex precursor modifications, thereby simplifying the overall patterning process
Solution Approach 2:
The photobase generator structure is designed to be universally compatible with polyimide precursors, providing a general-purpose solution that works with various precursor structures without requiring specific structural modifications
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The improved base generator achieves high sensitivity and large dissolution contrast between exposed and unexposed regions, enabling the formation of patterns with better shape and process margin, while reducing the need for high radiation doses and simplifying the patterning process.
Implementation Method 1
a base generator which is represented by the following chemical formula (1) and generates a base by exposure to electromagnetic radiation and heating
Data Source
AI summary
A photosensitive resin composition which is excellent in resolution, low in cost, and usable in a wide range of structures of polymer precursors each of which is reacted into a final product by a basic substance or by heating in the presence of a basic substance. The photosensitive resin composition includes a base generator which has a specific structure and generates a base by exposure to electromagnetic radiation and heating, and a polymer precursor which is reacted into a final product by the base generator and by a basic substance or by heating in the presence of a basic substance.