Photosensitive Resin Composition for Color Filter Chemical Resistance
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Solution Overview
Problem
Color filters for liquid crystal display devices require excellent chemical and heat resistance to withstand diverse liquid chemicals and heat treatments, while maintaining pattern stability and high contrast ratios.
Innovation Solution
A photosensitive resin composition comprising a dye polymer composite with specific repeating units, an acrylic-based photopolymerizable monomer, a photopolymerization initiator, and a solvent, which provides improved chemical resistance, heat resistance, and pattern developability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a color photosensitive resin is used to maintain pattern stability during chemical treatments, then chemical resistance is improved, but development margin is reduced
Solution Approach 1:
The patent modifies the chemical composition parameters of the photosensitive resin by incorporating specific acrylic-based photopolymerizable monomers with carboxyl groups and controlling the ratio of polymer to monomer. This chemical parameter adjustment enables the resin to achieve both high chemical resistance (maintaining pattern stability during stripping treatments) and adequate development margin (allowing proper pattern formation), resolving the contradiction between these two requirements
Solution Approach 2:
The patent creates a composite photosensitive resin system combining dye polymers, acrylic-based photopolymerizable monomers with carboxyl groups, and photopolymerization initiators. This composite material structure provides synergistic effects where the carboxyl-containing monomers enhance chemical resistance while the overall composition maintains developability, thus resolving the contradiction between chemical resistance and development margin
2Reliability
If the color filter is made more resistant to chemical treatments, then chemical resistance is improved, but heat resistance may be compromised
Solution Approach 1:
The patent optimizes the chemical composition parameters by selecting specific acrylic-based monomers with carboxyl groups and controlling their concentration relative to the polymer. This parameter optimization achieves a balance where the resin formulation provides sufficient chemical resistance for stripping treatments while maintaining thermal stability during subsequent heat treatment processes, resolving the contradiction between chemical and heat resistance
Solution Approach 2:
The patent applies different functional components to different aspects of performance: the carboxyl-containing acrylic monomers primarily provide chemical resistance, while the overall resin matrix composition is designed to maintain heat resistance. This localized functional assignment allows the material to excel in chemical resistance without compromising thermal properties, resolving the contradiction between these two resistance types
3Reliability
If a transparent conductive layer is formed on the color filter, then electrical conductivity is improved, but pattern precision is reduced due to etching limitations
Solution Approach 1:
The patent prepares the photosensitive resin layer in advance with optimized composition (including carboxyl-containing monomers and controlled polymer-to-monomer ratios) before the etching process. This preliminary optimization of the resist layer properties ensures that subsequent etching of the transparent conductive layer achieves high pattern precision with clean edges and minimal undercut, enabling precise ITO pattern formation while maintaining the conductive layer's electrical functionality
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition enhances the chemical resistance and heat resistance of color filters, maintaining pattern stability and achieving high contrast ratios and brightness characteristics.
Implementation Method 1
an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator
Data Source
AI summary
A photosensitive resin composition for a color filter includes (A) a dye polymer composite including a repeating unit derived from a compound represented by the following Chemical Formula 1, wherein in Chemical Formula 1, each substituent is the same as described in the detailed description, (B) an acrylic-based photopolymerizable monomer, (C) a photopolymerization initiator, and (D) a solvent, and a color filter using the same.