Photosensitive Resin Composition for Color Filter Patterning
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Solution Overview
Problem
Conventional color liquid crystal displays face challenges in achieving high aperture ratio and production efficiency due to low arrangement accuracy and increased process complexity, particularly in forming color filters on TFT array substrates, which require stripper resistance and multiple chemical treatments.
Innovation Solution
A photosensitive resin composition for color filters is developed, comprising an acrylic-based binder resin, photopolymerizable monomer, photopolymerization initiator, colorant, and solvent, with specific structural units and additives that enhance heat resistance, chemical resistance, and adhesion properties, allowing for improved patterning and high contrast ratios on TFT array substrates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional positive photoresist is used to form pixel electrodes on color filters, then the resist layer can be patterned, but the resist layer requires resistance against resist stripper and multiple chemical treatments are needed, deteriorating yield rate and production efficiency
Solution Approach 1:
The patent extracts and removes the pixel protective layer (resist layer) after pixel electrode formation using a simple aqueous alkaline solution, eliminating the need for complex resist stripper treatments. This extraction approach maintains patterning precision while dramatically improving production efficiency by reducing chemical treatment steps and increasing yield rate
Solution Approach 2:
The patent changes the chemical parameters of the resist layer by using a positive photoresist composition with specific solvents (ethylene glycol monomethyl ether acetate, ethyl lactate) and additives that enable the resist to be removed by mild aqueous alkaline treatment rather than requiring strong resist strippers, thus improving both patterning quality and production efficiency
2Area of stationary object
If the glass substrates of LCDs become larger to meet demand, then larger screens can be produced, but it takes longer for liquid crystal composition to cover the front side of substrates during vacuum injection
Solution Approach 1:
The patent applies preliminary action by forming the color filter pattern on the TFT array substrate before liquid crystal injection, creating a pre-structured surface that facilitates faster and more uniform liquid crystal distribution across large substrate areas during vacuum injection, thereby reducing coverage time
3Ease of manufacture
If a color filter is formed on TFT array substrate to simplify arrangement and increase aperture ratio, then manufacturing is simplified, but the color filter requires stripper resistance and multiple chemical treatments
Solution Approach 1:
The patent extracts the pixel protective layer using simple aqueous alkaline treatment after color filter formation, removing the need for complex resist stripper processes. This maintains the manufacturing simplicity advantage of COA method while eliminating the chemical treatment complexity
Solution Approach 2:
The patent modifies the chemical composition parameters of the photoresist layer to be compatible with mild aqueous alkaline removal, changing the resist chemistry from requiring strong strippers to being removable by simple alkaline solutions, thus reducing chemical treatment complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The photosensitive resin composition enables the formation of color filters with excellent heat resistance, chemical resistance, and patterning properties, leading to higher aperture ratios and improved production efficiency by simplifying the manufacturing process and enhancing adhesion to substrates.
Implementation Method 1
a photopolymerization initiator; (B) an acrylic-based photopolymerizable monomer
Data Source
AI summary
A photosensitive resin composition for a color filter includes (A) an acrylic-based binder resin including a structural unit represented by the following Chemical Formula 1, wherein the definitions of R1, R2, R3 and R4 are the same as set forth in specification; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant; and (E) a solvent.