Photosensitive Resin Composition for Uniform Thin Film Panel Coating
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Solution Overview
Problem
Conventional photosensitive organic insulating layers in display devices often suffer from stains, particularly as the devices increase in size, due to issues with coating and development, which degrade image quality.
Innovation Solution
A photosensitive resin composition comprising an alkali-soluble resin, quinone diazide, surfactants, and a solvent blend of diethylene glycol dialkyl ether, ethyl 3-ethoxy propionate, alkyl acetate, and alkyl lactate is used to form a thin film panel, improving coating uniformity and reducing stains through controlled evaporation and solubility.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional photosensitive organic insulating layers are used, then the insulating function is provided, but stains and spots are generated during coating and development, degrading image quality
Solution Approach 1:
The patent modifies the chemical composition parameters of the photosensitive resin by incorporating specific additives including a quinone diazide compound, a surfactant, and a photoinitiator system. These parameter changes in the resin formulation improve coating uniformity and prevent stain formation during the photolithography process, directly addressing the image quality degradation issue
Solution Approach 2:
The patent introduces a surfactant as an intermediary substance in the photosensitive resin composition. This surfactant acts as a mediator between the resin components and the substrate, improving wetting and coating uniformity, thereby preventing the formation of stains and spots during the coating and development processes
2Area of stationary object
If the display device size is increased, then the display area is expanded, but coating stains are frequently generated
Solution Approach 1:
The patent adjusts the rheological and compositional parameters of the photosensitive resin to maintain coating stability over large substrate areas. The modified resin formulation with specific additives ensures uniform coating properties across expanded display areas, preventing the generation of coating stains that typically occur with size increases
Solution Approach 2:
The patent incorporates a surfactant and photoinitiator system in advance within the photosensitive resin formulation. These preliminary additions prepare the resin for large-area coating by ensuring proper wetting, uniform distribution, and controlled curing, thereby preventing stain formation before the coating process even begins
3Illumination intensity
If organic insulating layers are used to increase transmittance, then luminance is improved, but stains remain after development due to incomplete dissolution
Solution Approach 1:
The patent introduces a surfactant as an intermediary that facilitates complete dissolution of the organic insulating layer during development. This surfactant enhances the interaction between the developer and the resin, ensuring thorough dissolution even in thick edge portions, thereby eliminating stains while preserving the high transmittance and luminance benefits of organic insulators
Solution Approach 2:
The patent modifies the chemical structure and solubility parameters of the photosensitive resin through additive incorporation. These parameter changes ensure that the resin maintains high transmittance for improved luminance while simultaneously achieving complete and uniform dissolution during development, preventing stain formation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition effectively minimizes stains and build-up, enhancing the transmissive and reflective characteristics of the insulating layer, leading to improved image quality and manufacturing efficiency.
Implementation Method 1
a surfactant... improving coating uniformity and reducing stains
Implementation Method 2
controlled evaporation... The solvent includes a diethylene glycol dialkyl ether... ethyl 3-ethoxy propionate
Implementation Method 3
a quinone diazide... performing a light exposure on the photosensitive resin composition
Data Source
AI summary
A photosensitive resin composition includes an alkali-soluble resin, a quinone diazide, a surfactant, and a solvent. The solvent includes a diethylene glycol dialkyl ether that includes an alkyl group including one to five carbon atoms, an ethyl 3-ethoxy propionate, an alkyl acetate that includes an alkyl group including three to eight carbon atoms, and an alkyl lactate that includes an alkyl group including one to six carbon atoms. The composition may be used to make high-quality display panels with uniformly-coated insulating layers.