Photosensitive Resin Composition High Dispersity Polymer Precursor

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Solution Overview

Problem

Existing photosensitive resin compositions for semiconductor applications have narrow exposure latitudes, limiting their versatility in forming interlayer insulating films for re-wiring layers.

Innovation Solution

A photosensitive resin composition with a heterocycle-containing polymer precursor having a high dispersity of 2.5 or more, selected from polyimide and polybenzoxazole precursors, is used, incorporating a polymerizable unsaturated group and a photoradical polymerization initiator or photoacid generator to widen the exposure latitude.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If a photosensitive resin composition uses conventional heterocycle-containing polymer precursors with low dispersity, then the composition maintains good processing stability, but the exposure latitude becomes narrow

Engineering Contradiction:
Improveexposure latitudeVSAvoidprocessing stability
Core Design Contradiction:
Adaptability or versatilityVSStability of the object's composition

Solution Approach 1:

The invention changes the dispersity parameter of the heterocycle-containing polymer precursor from conventional low values (typically 1.5-2.0) to high values of 2.5 or more. This parameter change fundamentally alters the molecular weight distribution, creating a broader range of molecular sizes that respond differently to exposure conditions, thereby widening exposure latitude while maintaining adequate processing stability

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The invention creates a composite photosensitive resin composition by combining the high dispersity heterocycle-containing polymer precursor (comprising both low molecular weight and high molecular weight components) with photopolymerization initiators and solvents. This composite structure allows different molecular weight components to contribute differently to the overall performance, achieving wide exposure latitude through the synergistic effect of diverse molecular species

Inventive Principle:
Principle #40Composite materials

2Adaptability or versatility

If the dispersity of heterocycle-containing polymer precursor is increased to 2.5 or more, then the exposure latitude widens, but the molecular weight distribution becomes broader

Engineering Contradiction:
Improveexposure latitudeVSAvoidmolecular weight control
Core Design Contradiction:
Adaptability or versatilityVSManufacturing precision

Solution Approach 1:

The invention embraces the dynamic nature of molecular weight distribution by intentionally creating a broad dispersity (≥2.5) rather than maintaining a narrow, fixed distribution. This dynamic approach allows the polymer precursor to exhibit a range of behaviors during exposure and development, with different molecular weight components responding to different exposure conditions, thereby achieving wide exposure latitude

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The invention fundamentally changes the dispersity parameter from the conventional narrow range (1.5-2.0) to a broad range (≥2.5), accepting and utilizing the resulting broader molecular weight distribution. This parameter change transforms what is traditionally viewed as a control challenge into a performance-enhancing feature that enables wide exposure latitude

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The composition achieves a wide exposure latitude, enabling effective formation of interlayer insulating films with improved resolution and sensitivity, suitable for semiconductor devices.

Implementation Method 1

incorporating a polymerizable unsaturated group and a photoradical polymerization initiator or photoacid generator to widen the exposure latitude

Methodology Applied
Scientific EffectPhotopolymerization: Photopolymerisation

Data Source

PatentUS10526448B2Precursor composition, photosensitive resin composition, method for producing precursor composition, cured film, method for producing cured film, and semiconductor device
Publication Date: 2020.01.07 FUJIFILM CORP
  • US10526448B2 patent drawing
  • US10526448B2 patent drawing
  • US10526448B2 patent drawing

AI summary

Provided are photosensitive resin compositions having a wide exposure latitude, a precursor composition for providing such a photosensitive resin composition, a method for producing a precursor composition, a cured film, a method for producing a cured film; and a semiconductor device. The precursor composition is a precursor composition containing at least one kind of heterocycle-containing polymer precursor, in which the heterocycle-containing polymer precursor is selected from a polyimide precursor and a polybenzoxazole precursor; and the dispersity which is a weight-average molecular weight/a number-average molecular weight of the heterocycle-containing polymer precursor is 2.5 or more.