Photosensitive Resin Composition for Flexographic Printing Plates

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Solution Overview

Problem

Current photosensitive resin compositions for flexographic printing fail to simultaneously achieve high cold flow resistance, transparency, image reproducibility, and prevention of printing plate surface smear.

Innovation Solution

A photosensitive resin composition comprising a block copolymer with a conjugated diene unit and a vinyl aromatic hydrocarbon unit, combined with a photopolymerizable monomer and an organosilicon compound containing a silicone oil with an amino group, which maintains the resin's properties during storage and transportation while preventing surface smear.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Object-affected harmful factors

If an organosilicon compound is added to a block copolymer to prevent printing plate surface smear, then the preventing effect on surface smear is improved, but the transparency and cold flow resistance deteriorate

Engineering Contradiction:
Improveprinting plate surface smearVSAvoidcold flow resistance
Core Design Contradiction:
Object-affected harmful factorsVSReliability

Solution Approach 1:

The patent applies parameter changes by precisely controlling the amino group equivalent weight of the organosilicon compound (300-1000 g/mol) and its content in the resin composition (0.01-5 parts by mass per 100 parts of block copolymer). This optimization allows the composition to achieve ink repellency while maintaining cold flow resistance and transparency, resolving the contradiction between preventing surface smear and maintaining material reliability.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent uses a composite material approach by combining a specific block copolymer (with conjugated diene and vinyl aromatic hydrocarbon units) with a specially selected organosilicon compound containing amino groups. This composite formulation creates a synergistic effect where the organosilicon compound provides ink repellency without compromising the cold flow resistance and transparency of the block copolymer matrix.

Inventive Principle:
Principle #40Composite materials

2Object-affected harmful factors

If an organosilicon compound is added to a block copolymer to prevent printing plate surface smear, then the preventing effect on surface smear is improved, but the transparency deteriorates

Engineering Contradiction:
Improveprinting plate surface smearVSAvoidtransparency
Core Design Contradiction:
Object-affected harmful factorsVSIllumination intensity

Solution Approach 1:

The patent optimizes the parameters of the organosilicon compound, specifically its amino group equivalent weight (300-1000 g/mol) and concentration (0.01-5 parts by mass per 100 parts of block copolymer), to achieve the minimum effective concentration for ink repellency while minimizing impact on optical properties. This parameter optimization maintains transparency while preventing surface smear.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent creates a composite material system where the organosilicon compound with amino groups is integrated into the block copolymer matrix. This composite formulation ensures that the organosilicon compound provides ink repellency through its chemical properties while the block copolymer matrix maintains the optical transparency required for flexographic printing.

Inventive Principle:
Principle #40Composite materials

3Object-affected harmful factors

If an organosilicon compound is added to a block copolymer to prevent printing plate surface smear, then the preventing effect on surface smear is improved, but the image reproducibility deteriorates

Engineering Contradiction:
Improveprinting plate surface smearVSAvoidimage reproducibility
Core Design Contradiction:
Object-affected harmful factorsVSManufacturing precision

Solution Approach 1:

The patent precisely controls the amino group equivalent weight of the organosilicon compound within the range of 300-1000 g/mol and its content in the resin composition. This parameter optimization ensures that the organosilicon compound provides sufficient ink repellency while maintaining the image reproducibility required for high-quality printing by avoiding excessive surface modification that would distort the printed image.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The composition effectively prevents printing plate surface smear while maintaining high cold flow resistance and transparency, ensuring high image reproducibility and durability.

Implementation Method 1

the whole construct surface is first subjected to ultraviolet-ray exposure (back exposure) through the support to photopolymerize the resin composition to make a uniform thin cured layer

Methodology Applied
Scientific EffectPhotopolymerization: Photopolymerisation

Implementation Method 2

a photosensitive resin composition for printing base materials which contains a resin having a molecular weight of not less than 1,000 and not more than 200,000 and having a polymerizable unsaturated group, and an organosilicon compound having a Si-O bond and is capable of being laser engraved

Methodology Applied
Scientific EffectInk-repellent effect: Hydrophobe

Implementation Method 3

an ultraviolet-ray shielding layer which contains an infrared-ray sensitive substance and can be ablated with an infrared laser

Methodology Applied
Scientific EffectInfrared absorption and ablation: Laser Ablation

Data Source

PatentEP2006737B1Photosensitive resin composition for flexographic printing
Publication Date: 2015.01.07 ASAHI KASEI CHEM CORP
  • EP2006737B1 patent drawing

AI summary

There is provided a photosensitive resin composition for a solvent-developing or thermally-developing flexographic printing plate, the photosensitive resin composition comprising: (a) a block copolymer containing a polymer block having conjugated diene as a main component and a polymer block having a vinyl aromatic hydrocarbon as a main component; (b) a photopolymerizable monomer; (c) a photopolymerization initiator; and (d) an organosilicon compound. A photosensitive resin composition for printing in which the organosilicon compound is a silicone oil containing a specific group is preferable, and a photosensitive resin composition for printing in which the organosilicon compound is a silicone oil containing an amino group or an aryl group is most preferable. by any of various methods. For example, there are following methods. A method may involve dissolving and mixing raw materials of the photosensitive resin composition in an appropriate solvent such as chloroform, tetrachloroethylene, methyl ethyl ketone or toluene, casting the solution into a mold and evaporating the solvent to make a plate-like construct. A method may involve, without using any solvent, kneading the mixture in a kneader, roll mill or screw extruder, and then molding it into a predetermined thickness by a calendar roll or press. However, the present invention is not limited to these preparation methods. For providing the protecting layer or the ultraviolet-ray shielding layer on the surface of the photosensitive resin layer, raw materials thereof may be dissolved or dispersed in an appropriate solvent with forced stirring by stirring blades or ultrasonic stirring; or the raw materials are pre-kneaded using an extruder or kneader and then dispersed or dissolved in an appropriate solvent, and the dispersion or solution may be coated directly on the photosensitive resin layer. Further, a cover sheet composed of polyester, polypropylene or the like may be provided on the protecting layer or the ultraviolet-ray shielding layer. Alternatively, a solution for the protecting layer or the ultraviolet-ray shielding layer is coated on a cover