Positive Photosensitive Resin Composition for High Refractive Index and Transparency
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Solution Overview
Problem
Current positive photosensitive resin compositions for solid state image sensors face challenges in achieving high sensitivity, resolution, and refractive index while maintaining transparency, due to issues such as insufficient transparency, sensitivity, and residue formation during development.
Innovation Solution
A positive photosensitive resin composition comprising polysiloxane synthesized by hydrolyzing and partially condensing organosilanes, combined with aluminum, tin, titanium, or zirconium compound particles, and a naphthoquinonediazide compound, which enhances sensitivity and resolution while achieving high refractive index and transparency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Illumination intensity
If siloxane-based resin composition is used to achieve high refractive index, then refractive index is improved, but sensitivity at exposure time becomes insufficient
Solution Approach 1:
The patent uses a composite resin composition containing siloxane-based resin (for high refractive index), polyhydric alcohol (for sensitivity enhancement), and metal compound particles (for additional refractive index improvement). This composite approach allows simultaneous achievement of high refractive index and high sensitivity by combining materials with complementary properties.
Solution Approach 2:
The patent modifies the chemical composition parameters of the resin system by introducing polyhydric alcohol and metal compound particles, changing the physical and chemical properties to achieve both high refractive index and high sensitivity without the trade-off present in conventional single-component systems.
2Illumination intensity
If siloxane-based resin composition is used to achieve high refractive index, then refractive index is improved, but residue formation during development increases
Solution Approach 1:
The composite resin system combines siloxane-based resin with polyhydric alcohol and metal compound particles to create a formulation that maintains high refractive index while improving development characteristics and reducing residue formation, thereby achieving both optical performance and manufacturing precision.
Solution Approach 2:
The patent introduces metal compound particles as localized high-refractive-index regions within the resin matrix, allowing the bulk resin to maintain good development properties while the particles provide the necessary refractive index enhancement without causing widespread residue formation.
3Reliability
If polyamide acid or phenolic hydroxyl group containing materials are used, then sensitivity is improved, but transparency deteriorates due to coloring
Solution Approach 1:
The patent extracts and eliminates the coloring components (polyamide acid and phenolic hydroxyl groups) from the resin system while retaining the essential functional properties needed for sensitivity, using alternative materials that do not exhibit unwanted absorption in the visible range.
Solution Approach 2:
The patent employs a resin composition that prioritizes optical clarity and sensitivity over long-term durability of individual components, using materials that provide the necessary photoresist functionality with minimal coloration, accepting that the resin serves its primary purpose in the imaging process.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves high sensitivity and resolution with a cured film having a high refractive index and excellent transparency, reducing residue formation and improving pattern formation capabilities.
Implementation Method 1
a positive photosensitive resin composition containing (a) a polysiloxane synthesized by hydrolyzing and partially condensing an organosilane represented by the following general formula (1) and an organosilane oligomer, (b) aluminum compound particles, tin compound particles, titanium compound particles, zirconium compound particles, complex particles of the compounds or complex particles of any of the compounds and a silicon compound, (c) a naphthoquinonediazide compound
Implementation Method 2
a polysiloxane synthesized by hydrolyzing and partially condensing an organosilane represented by the following general formula (1) and an organosilane oligomer
Implementation Method 3
aluminum compound particles, tin compound particles, titanium compound particles, zirconium compound particles, complex particles of the compounds or complex particles of any of the compounds and a silicon compound
Data Source
AI summary
Disclosed is a positive photosensitive resin composition which is characterized by containing (a) a polysiloxane that is synthesized by hydrolyzing and partially condensing a specific organosilane and an organosilane oligomer, (b) aluminum compound particles, tin compound particles, titanium compound particles, zirconium compound particles, composite particles of the aforementioned compounds or composite particles of any of the aforementioned compounds and a silicon compound, (c) a naphthoquinonediazide compound and (d) a solvent. The positive photosensitive resin composition is also characterized in that the organosilane oligomer contains a specific organosilane. The positive photosensitive resin composition has achieved excellent sensitivity and resolution without deteriorating high refractive index and high transparency.