Photosensitive Resin Composition for Fast Cyclization Stability
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing photosensitive resin compositions for semiconductor manufacturing exhibit slow cyclization reaction progress and poor storage stability due to uncontrolled reaction conditions, leading to inefficiencies in the production of semiconductor elements.
Innovation Solution
A photosensitive resin composition with a heterocyclic ring-containing polymer precursor and a solvent, where the solid content has an amine value of 0.0002 to 0.0200 mmol/g, facilitating a fast cyclization rate and improved storage stability, is developed. This composition includes a polyimide or polybenzoxazole precursor with specific repeating units and a photo-radical polymerization initiator, enhancing the curing process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a photosensitive polyimide resin composition is used to simplify the pattern forming step, then the manufacturing process is simplified, but the cyclization reaction progress becomes slow and storage stability deteriorates
Solution Approach 1:
The patent applies parameter changes by precisely controlling the amine value of the polyimide precursor within a specific range (0.001 to 0.05 mmol/g) and adjusting the composition ratios of polymer precursors and photoinitiators. These parameter optimizations enable both fast cyclization reaction and good storage stability, resolving the contradiction between reaction speed and process simplification.
Solution Approach 2:
The patent uses a composite resin composition containing multiple polymer precursors (polyimide precursor, polybenzoxazole precursor) and various photoinitiators in specific combinations. This composite approach allows the system to achieve both simplified processing and high productivity through synergistic effects of the different components.
2Ease of manufacture
If a photosensitive polyimide resin composition is used to simplify the pattern forming step, then the manufacturing process is simplified, but the storage stability over time becomes poor
Solution Approach 1:
The patent controls the amine value parameter within a narrow optimal range (0.001 to 0.05 mmol/g) and adjusts the composition ratios of various precursors and photoinitiators. These precise parameter changes ensure both process simplification and excellent storage stability, preventing premature cyclization during storage while maintaining ease of manufacture.
3Productivity
If the amine value of the polyimide precursor is increased to accelerate cyclization, then the cyclization reaction speed improves, but the storage stability deteriorates
Solution Approach 1:
The patent identifies and optimizes the amine value parameter, setting it within a specific range (0.001 to 0.05 mmol/g) that balances cyclization speed and storage stability. This precise parameter control resolves the contradiction by finding the optimal window where both requirements are satisfied simultaneously.
Solution Approach 2:
The patent employs feedback control by measuring and adjusting the amine value of the polyimide precursor to ensure it falls within the optimal range. This feedback mechanism allows precise control of the cyclization reaction rate while maintaining storage stability, enabling both high productivity and reliability.
4Reliability
If the amine value of the polyimide precursor is decreased to improve storage stability, then the storage stability improves, but the cyclization reaction speed becomes slow
Solution Approach 1:
The patent optimizes the amine value parameter within a specific range (0.001 to 0.05 mmol/g) that simultaneously achieves good storage stability and adequate cyclization speed. This parameter optimization resolves the contradiction by finding the balance point where both storage reliability and production efficiency are satisfied.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The optimized photosensitive resin composition achieves a balance between rapid cyclization and long-term storage stability, improving the manufacturing efficiency and quality of semiconductor devices by ensuring a fast and controlled curing process.
Implementation Method 1
a photo-radical polymerization initiator, enhancing the curing process
Data Source
AI summary
Provided are a photosensitive resin composition in which the progress of cyclization reaction is fast and storage stability over time is excellent, a heterocyclic ring-containing polymer precursor, a cured film, a laminate, a method for producing a cured film, and a semiconductor device, using the photosensitive resin composition. The photosensitive resin composition includes a heterocyclic ring-containing polymer precursor selected from a polyimide precursor and a polybenzoxazole precursor, and a solvent, in which a solid content of the photosensitive resin composition has an amine value of 0.0002 to 0.0200 mmol/g.