Photosensitive Resin Composition for Light Blocking Layer Pattern Control
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current light blocking layers in liquid crystal display devices face challenges in achieving excellent pattern-forming capability, developability, and chemical resistance while maintaining a film step difference and controlling pattern tilt angles, which are essential for forming both black matrices and column spacers in a single process.
Innovation Solution
A photosensitive resin composition comprising a cardo-based resin with specific molecular weight ranges, a photopolymerizable monomer, a photopolymerization initiator, a colorant, and a solvent, which includes a binder resin with a spirobifluorene backbone for improved heat resistance and sensitivity, and a photopolymerizable monomer for enhanced curing, along with a colorant for optical density, is used to form a light blocking layer with a controlled tilt angle.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional photosensitive resin compositions are used to form light blocking layers, then the manufacturing process is simple, but the pattern-forming capability, developability, and chemical resistance are insufficient
Solution Approach 1:
The patent employs a composite photosensitive resin composition comprising multiple functional components: a binder resin (acrylic or epoxide-based), a photopolymerizable monomer, a photopolymerization initiator, and a colorant. This composite formulation integrates diverse material properties to simultaneously achieve excellent pattern-forming capability, developability, and chemical resistance that cannot be obtained with single-material systems.
Solution Approach 2:
The patent optimizes specific parameter ranges for each component to achieve the desired performance. For example, the binder resin contains specific functional groups (acrylic or epoxide) with controlled molecular weights, the photopolymerizable monomer is present at specific concentrations, and the colorant provides controlled optical density. These parameter optimizations enable the composition to form patterns with precise control over tilt angles and film step differences.
2Productivity
If a single material is used to form both black matrix and column spacer, then the manufacturing process is simplified, but the control over film step difference and pattern tilt angle is difficult
Solution Approach 1:
The patent uses a multifunctional photosensitive resin composition that can simultaneously form both the black matrix and column spacer structures in a single coating and curing process. The composition contains colorants for black matrix formation and photopolymerizable components for three-dimensional structure development, enabling dual functionality from a single material system.
Solution Approach 2:
The patent controls the pattern tilt angle and film step difference by optimizing exposure conditions and composition parameters. The photopolymerizable monomer and initiator system allows precise control of curing depth and rate, while the colorant concentration and particle size distribution influence light absorption and pattern formation. These parameter adjustments enable the formation of patterns with tilt angles within specific ranges (e.g., 30-60 degrees) and controlled film step differences.
3Manufacturing precision
If the photosensitive resin composition is optimized for pattern-forming capability, then the pattern quality is improved, but the chemical resistance may be compromised
Solution Approach 1:
The patent uses a composite binder resin system combining acrylic and/or epoxide-based resins with specific functional groups. The acrylic component (with carboxyl or hydroxyl groups) provides excellent pattern-forming capability and developability, while the epoxide component contributes to chemical resistance and crosslinking density. This composite approach allows simultaneous optimization of pattern quality and chemical resistance.
Solution Approach 2:
The patent achieves different properties in different regions of the formed pattern. The exposed regions undergo photopolymerization to form crosslinked structures with high chemical resistance, while the unexposed regions remain soluble for development. The colorant distribution and photopolymerizable monomer concentration are optimized to create local property variations that enable both high-quality pattern formation and adequate chemical resistance in the cured regions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves excellent pattern-forming capability, developability, and chemical resistance, allowing for the simultaneous formation of black matrices and column spacers with a film step difference and tilt angles between 20 to 50 degrees, maintaining stability even after post-baking.
Implementation Method 1
a photopolymerization initiator; (B) a photopolymerizable monomer
Data Source
AI summary
Disclosed are a photosensitive resin composition including (A) a binder resin including a cardo-based resin including a repeating unit represented by the following Chemical Formula 1, (B) a photopolymerizable monomer, (C) a photopolymerization initiator, (D) a colorant and (E) a solvent, and a light blocking layer using the same. In the above Chemical Formula 1, each substituent is the same as defined in the detailed description.