Photosensitive Resin Composition for Accurate Pattern Formation

The patent employs a composite resin system combining multiple components: (1) a resin with acid-labile protecting groups (e.g., carbonyl, carboxyl, or ester groups) that provide both compactness and development resistance, (2) a crosslinking agent containing a ring structure with a double bond, and (3) a photopolymerization initiator. This composite approach allows the protective film to achieve both compactness through the acid-labile resin and development resistance through the crosslinked network formed by the ring-containing crosslinking agent, resolving the contradiction between these two properties.

The patent modifies the chemical structure parameters of the resin composition by introducing specific functional groups (acid-labile protecting groups) and controlling the molecular structure of the crosslinking agent (ring structure with double bond). By changing these chemical parameters, the resin achieves both compactness and enhanced development resistance, as the crosslinked network formed during photopolymerization prevents dissolution while maintaining the compact structure.

The composite resin system provides both pattern accuracy and development resistance. The acid-labile resin component enables precise pattern formation through controlled photopolymerization, while the crosslinking agent with ring structure creates a robust network that resists development, ensuring the accuracy of the desired patterns is maintained throughout the manufacturing process.

The crosslinking agent is incorporated into the resin composition in advance, forming a crosslinked network structure before pattern formation. This preliminary crosslinking action creates a stable framework that maintains pattern accuracy during subsequent processing and development steps, preventing degradation of the desired patterns.