Photosensitive Resin Composition for Pattern Profile Control

The patent combines a high-sensitivity photosensitive agent (compound of formula 1) with a standard-sensitivity photosensitive agent (compound of formula 2) in specific proportions (0.01-5 mass% high-sensitivity agent and 95-95 mass% standard-sensitivity agent). This merging allows the composition to benefit from the high sensitivity of the first compound while the second compound provides a broader exposure dose range, thereby improving handleability without sacrificing sensitivity.

By merging a high-sensitivity photosensitive agent (formula 1) with a standard-sensitivity photosensitive agent (formula 2) in controlled proportions, the patent achieves both high sensitivity and good pattern shape control. The standard-sensitivity agent contributes to stable pattern formation and profile control, while the high-sensitivity agent maintains high sensitivity. The specific composition ratio ensures that neither agent dominates, allowing balanced performance in both sensitivity and pattern control.

The patent optimizes the concentration parameter of the high-sensitivity photosensitive agent (formula 1) to be 0.01-5 mass% in the composition. At this controlled concentration range, the high-sensitivity agent provides sufficient sensitivity enhancement without causing excessive pattern profile changes. The standard-sensitivity agent (formula 2) acts as a buffer that stabilizes the pattern profile, preventing large variations even when the high-sensitivity agent is present.