Photosensitive Resin Quantum Dot Patterning
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Solution Overview
Problem
Current methods for forming quantum dot patterns face challenges such as inaccuracy, low resolution, and difficulties in large-scale production due to limitations in printing techniques, including ink diffusion and low resolution, which hinder the widespread application of quantum dots in display and other fields.
Innovation Solution
A photosensitive resin composition is developed, incorporating quantum dots with a modification layer dispersed in a specific formulation that includes an alkali soluble resin, photosensitive resin or monomer, photoinitiator, solvent, silane coupling agent, and additive, allowing for a method of coating, exposing, and developing to achieve high-resolution quantum dot patterns with stable bonding to substrates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If printing methods such as transfer printing and micro-contact printing are used to form quantum dot patterns, then quantum dots can be transferred to substrates, but the resolution is low (at a level of 100 microns) and pattern accuracy deteriorates due to ink diffusion
Solution Approach 1:
The patent changes the fundamental parameter of pattern formation from mechanical printing to photochemical etching. By incorporating quantum dots into a photosensitive resin composition and using photomask-based exposure, the resolution improves from 100 microns to the micrometer or sub-micrometer scale, eliminating ink diffusion issues while maintaining manufacturability through standard photolithography processes
Solution Approach 2:
The patent replaces the mechanical printing system with a photochemical system. Instead of physically transferring quantum dots through contact printing, the invention uses light exposure to selectively remove resin and expose quantum dots, achieving higher precision without mechanical contact or ink diffusion
2Ease of manufacture
If printing methods are used to form quantum dot patterns, then patterns can be formed on substrates, but large-scale production becomes difficult
Solution Approach 1:
The patent makes the quantum dot pattern formation process universal by using standard photolithography equipment and materials that are already widely used in semiconductor and display manufacturing. The photosensitive resin composition can be processed using existing coating, exposure, and development equipment, enabling large-scale production without requiring specialized printing equipment
3Ease of manufacture
If printing methods are used to form quantum dot patterns, then quantum dots can be deposited on substrates, but the bonding stability between quantum dots and substrate deteriorates
Solution Approach 1:
The patent merges the quantum dots with the photosensitive resin matrix during the patterning process. The quantum dots are embedded in the resin before exposure and development, creating a unified structure where the resin acts as both the patterning medium and the bonding adhesive, ensuring stable attachment to the substrate
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method enables the formation of fine, stable quantum dot patterns with high resolution and facilitates mass production, improving the application prospects of quantum dots by overcoming previous limitations in pattern formation and substrate bonding.
Implementation Method 1
0.5 wt % to 18 wt % a photosensitive resin or monomer containing vinyl unsaturated double-bond, 0.1 wt % to 3 wt % of a photoinitiator
Implementation Method 2
quantum dots which are dispersed in the photosensitive resin composition and each has a modification layer
Data Source
AI summary
The present disclosure provides a photosensitive resin composition and a method for forming a quantum dot pattern using the same. The photosensitive resin composition includes quantum dots which are dispersed in the photosensitive resin composition and each has a modification layer. The method for forming a quantum dot pattern includes coating, exposing and developing a photoresist to obtain the quantum dot pattern, wherein the photoresist is the above-mentioned photosensitive resin composition.