Photosensitive Resin Composition for Thin-Film Transistor Substrates
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Solution Overview
Problem
The Vertical Alignment (VA) mode in liquid crystal display devices has a relatively lower response speed compared to other modes, and the organic layer with a mountain structure, while improving response speed, often results in non-uniform liquid crystal alignment due to concave and convex structures.
Innovation Solution
A photosensitive resin composition comprising an acryl-based copolymer and a 1,2-quinonediazide compound is used to form an organic layer pattern with improved local flatness, achieved by exposing the composition to light and developing it to create a tilted layer with a tapered structure, which enhances the response speed and uniformity of liquid crystal alignment.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Speed
If an organic layer with a mountain structure is formed to improve response speed in VA mode, then the response speed is improved, but concave and convex structures are generated causing non-uniform liquid crystal alignment
Solution Approach 1:
The patent changes the chemical composition parameters of the photosensitive resin by incorporating specific monomers (isobonyl carboxylate-based compound, unsaturated compound with epoxy group, olefin-based unsaturated compound, and unsaturated carboxylic acid or anhydride) in defined proportions. This chemical parameter change enables the resin to form an organic layer with improved local flatness while maintaining the mountain structure needed for fast response speed, thereby resolving the contradiction between response speed and surface uniformity.
Solution Approach 2:
The patent uses a composite photosensitive resin system combining multiple components: acryl-based copolymer, 1,2-quinonediazide compound, and specific monomers listed above. This composite material approach allows the organic layer to simultaneously achieve the mountain structure for rapid response and the local flatness for uniform liquid crystal alignment, eliminating the harmful concave and convex structures present in conventional single-component resins.
2Productivity
If conventional photosensitive resin is used to form mountain structure, then response speed improves, but local flatness deteriorates due to concave and convex structures
Solution Approach 1:
The patent modifies the resin composition parameters by incorporating specific monomers (isobonyl carboxylate-based compound, unsaturated compound with epoxy group, olefin-based unsaturated compound, and unsaturated carboxylic acid or anhydride) in defined proportions. This chemical parameter change enables the resin to form an organic layer with improved local flatness while maintaining the mountain structure needed for fast response speed, thereby resolving the contradiction between response speed and surface uniformity.
Solution Approach 2:
The patent uses a composite photosensitive resin system combining multiple components: acryl-based copolymer, 1,2-quinonediazide compound, and specific monomers listed above. This composite material approach allows the organic layer to simultaneously achieve the mountain structure for rapid response and the local flatness for uniform liquid crystal alignment, eliminating the harmful concave and convex structures present in conventional single-component resins.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The improved local flatness of the organic layer pattern accelerates the response speed of liquid crystals and ensures uniform alignment, addressing the non-uniformity issues in conventional mountain-structured organic layers.
Implementation Method 1
A photosensitive resin composition comprising an acryl-based copolymer and a 1,2-quinonediazide compound is used to form an organic layer pattern with improved local flatness, achieved by exposing the composition to light and developing it
Data Source
AI summary
A photosensitive resin composition for an organic layer pattern includes about 100 parts by weight of an acryl-based copolymer and about 5 to about 100 parts by weight of a 1,2-quinonediazide compound. The acryl-based copolymer is prepared by copolymerizing about 5 to about 60 percent by weight of an isobonyl carboxylate-based compound based on a total weight of the acryl-based copolymer, about 10 to about 30 percent by weight of an unsaturated compound carrying an epoxy group, about 20 to about 40 percent by weight of an olefin-based unsaturated compound, and about 10 to about 40 percent by weight of one selected from unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, and a mixture thereof. Methods of manufacturing a TFT substrate and a common electrode substrate using the photosensitive resin composition are also provided. Advantageously, the organic layer pattern may have a mountain structure having an improved local flatness without concave and convex structures.