Photosensitive composition, transfer film, laminate production method, laminate, and semiconductor package
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Solution Overview
Problem
Existing photosensitive compositions used in semiconductor manufacturing fail to achieve high resolution and low relative permittivity, limiting their effectiveness in forming insulating films.
Innovation Solution
A photosensitive composition comprising a siloxane polymer with a carboxy group and a compound β that reduces the carboxy group upon exposure, along with a filler, to enhance resolution and reduce permittivity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If existing photosensitive compositions are used, then the insulating film can be formed, but the resolution and relative permittivity cannot be sufficiently improved
Solution Approach 1:
The patent changes the chemical composition parameters of the photosensitive material by incorporating siloxane polymer with carboxy groups and compound β that reduces carboxy groups upon exposure. This chemical parameter change enables simultaneous achievement of high resolution patterning and low relative permittivity properties in the cured insulating film.
Solution Approach 2:
The patent creates a composite photosensitive composition combining siloxane polymer containing carboxy groups with compound β. This composite material system allows the carboxy groups to provide resolution enhancement through specific photochemical reactions while the siloxane backbone maintains low permittivity, resolving the contradiction between resolution and permittivity.
2Manufacturing precision
If the carboxy group amount is reduced upon exposure, then the resolution improves, but the chemical composition control becomes more difficult
Solution Approach 1:
Compound β acts as an intermediary substance that facilitates the reduction of carboxy groups upon exposure. This intermediary enables controlled decarboxylation reactions that enhance pattern resolution while the systematic formulation approach maintains composition control, resolving the contradiction between resolution improvement and composition complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition enables the formation of patterns with excellent resolution and low relative permittivity, improving the performance of insulating films in semiconductor manufacturing.
Implementation Method 1
a compound β having a structure capable of accepting an electron from the carboxy group included in the siloxane polymer in a photoexcited state
Implementation Method 2
a compound β having a structure that allows decarboxylation reaction of the carboxy group included in the siloxane polymer to occur upon exposure to thereby reduce an amount of the carboxy group included in the siloxane polymer
Implementation Method 3
the siloxane polymer further has a polymerizable group
Data Source
AI summary
The first object of the invention is to provide a photosensitive composition that makes it possible to form a pattern having excellent resolution and a low relative permittivity. The second object is to provide a transfer film, a laminate production method, a laminate, and a semiconductor package that are related to the photosensitive composition. The photosensitive composition includes: a siloxane polymer having a carboxy group; and a compound β having a structure that allows an amount of the carboxy group included in the siloxane polymer to reduce upon exposure.