Photosensitive Siloxane Composition for Taper Angle Control
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Solution Overview
Problem
Existing photosensitive siloxane compositions struggle to form patterns with desired taper angles and line widths, often resulting in contamination, deterioration of electric properties, and increased costs due to the need for precise control of additives like photo acid generators.
Innovation Solution
A photosensitive siloxane composition comprising a polysiloxane with specific repeating units, a photoactive agent, and a solvent, which allows for controlled taper angle formation by minimizing linewidth change during curing, thereby enabling the creation of desired patterns with improved hardness and transparency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Shape
If the contents of photo acid generators are controlled to adjust taper angle, then the taper angle can be adjusted, but contamination occurs, electric properties deteriorate, and cost increases
Solution Approach 1:
The invention changes the chemical composition parameters of the photosensitive siloxane composition by incorporating specific polysiloxane structures (formula ia and ia') with controlled ratios, replacing the conventional method of adjusting photo acid generator contents. This parameter change achieves taper angle control without the harmful effects of contamination and electric property deterioration associated with photo acid generator adjustment.
Solution Approach 2:
The invention uses a composite photosensitive siloxane composition comprising multiple polysiloxane components with specific structures (formula ia and ia') combined in controlled ratios. This composite material approach provides inherent control over pattern formation and taper angle without relying on photo acid generators, thereby avoiding contamination and electric property deterioration while reducing cost.
2Manufacturing precision
If conventional photosensitive materials are used for planarization, then planarization properties and photosensitivity are achieved, but resolution and frame frequency improvement become difficult due to severe planarization requirements
Solution Approach 1:
The invention changes the material parameters by using photosensitive siloxane composition with specific polysiloxane structures that provide both excellent planarization properties and high resolution patterning capability. The controlled composition (formula ia and ia' structures) enables the film to achieve desired flatness while maintaining the ability to form precise patterns, thus resolving the contradiction between planarization ease and manufacturing precision.
3Reliability
If polysiloxane is used to form cured film, then high heat resistance, transparency, and resolution are achieved, but control over taper angle and line width is insufficient
Solution Approach 1:
The invention modifies the polysiloxane composition parameters by incorporating specific structural units (formula ia and ia') in controlled ratios. This parameter optimization maintains the inherent advantages of polysiloxane (heat resistance, transparency) while adding the capability to precisely control taper angle and line width through the compositional design, resolving the previous insufficiency in manufacturing precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition effectively controls taper angles and maintains pattern linewidth, reducing contamination and cost issues while enhancing the properties of the cured film, such as hardness and transparency.
Implementation Method 1
a photoactive agent
Implementation Method 2
heating it to perform crosslinking
Data Source
AI summary
To provide a photosensitive siloxane composition capable of forming a pattern having a desired taper angle and a desired linewidth.[Means] The present invention provides a photosensitive siloxane composition comprising: a polysiloxane having a structure represented by the following formula (ia′): (L is an alkylene or phenylene), a photoactive agent, and a solvent.