Piezoelectric Lever Actuator for Dynamic Showerhead Tilt Adjustment

Solution Overview

Problem

Semiconductor substrate processing apparatuses face challenges with non-uniform film deposition due to misalignment of the showerhead module, requiring time-consuming manual adjustments and affecting the uniformity of process gas delivery to the substrate.

Innovation Solution

A semiconductor substrate processing apparatus with a showerhead module adjustment mechanism using piezoelectric actuators and a lever motion amplifier, allowing dynamic adjustment of the showerhead module's tilt and position without breaking vacuum, ensuring precise planarization and improved uniformity in film deposition.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of operation

If manual adjustment of showerhead module is used, then installation and removal can be performed, but it is time consuming and requires breaking vacuum

Engineering Contradiction:

Core Design Contradiction:

Ease of operationVSLoss of time

Solution Approach 1:

The patent replaces manual mechanical adjustment with an automated actuator system that uses piezoelectric elements to dynamically adjust the showerhead module's tilt angle. This eliminates the need for time-consuming manual intervention and allows adjustments to be made quickly during operation without breaking vacuum.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent introduces a dynamic adjustment mechanism that allows the showerhead module to change its tilt angle in real-time during substrate processing. The actuator system enables continuous adjustment of the showerhead position, transforming a static configuration into a dynamically adjustable one, thereby reducing adjustment time and improving operational flexibility.

Inventive Principle:

Principle #15Dynamics

2Device complexity

If showerhead module is fixed in position, then structural simplicity is maintained, but non-uniform film deposition occurs due to misalignment

Engineering Contradiction:

Core Design Contradiction:

Device complexityVSManufacturing precision

Solution Approach 1:

The patent employs piezoelectric actuators to precisely control the showerhead module's tilt angle, replacing crude mechanical adjustment mechanisms. This enables fine-tuned positioning that ensures uniform film deposition across the substrate while maintaining relatively simple overall device architecture.

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent incorporates sensors that monitor the showerhead module's position and the uniformity of film deposition in real-time. This feedback information is used by the control system to dynamically adjust the tilt angle via the actuator, ensuring optimal alignment and uniform deposition without requiring complex pre-calibration mechanisms.

Inventive Principle:

Principle #23Feedback

3Measurement precision

If dynamic adjustment mechanism is added, then planarization precision is improved, but device complexity increases

Engineering Contradiction:

Core Design Contradiction:

Measurement precisionVSDevice complexity

Solution Approach 1:

The patent divides the adjustment function into multiple independent piezoelectric actuators positioned at different locations on the showerhead module. Each actuator controls a specific aspect of the tilt angle, allowing for precise independent adjustment of different degrees of freedom. This segmentation enables high precision planarization while keeping each individual actuator component relatively simple.

Inventive Principle:

Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution enables rapid and precise adjustment of the showerhead module, reducing the time required for leveling and ensuring uniform film deposition across the substrate, enhancing processing efficiency and maintaining high resolution and accuracy.

Implementation Method 1

a piezoelectric stack, which dynamically adjusts tilt of the faceplate of the showerhead module

Methodology Applied

Scientific EffectPiezoelectric effect: Piezoelectric Effect

Implementation Method 2

The at least one actuator assembly can comprise a lever, which mechanically amplifies displacement of a piezoelectric stack

Methodology Applied

Scientific EffectMechanical advantage: Mechanical Advantage

Implementation Method 3

the upper flexure portion and the flexure mount are configured to reduce stress on the piezoelectric stack

Methodology Applied

Scientific EffectElasticity: Elasticity

Implementation Method 4

an end of the lever opposite to the piezoelectric stack acts on a ball joint of the adjustment screw via a socket-groove

Methodology Applied

Scientific EffectBall and socket joint: Ball

Data Source

PatentUS11230765B2Actuator to adjust dynamically showerhead tilt in a semiconductor-processing apparatus

Publication Date: 2022.01.25

AI summary

In various embodiments, a showerhead mechanism to adjust a showerhead in a semiconductor substrate-processing apparatus is disclosed. The mechanism includes at least one actuator assembly that is dynamically operable to adjust parallelism of a faceplate of the showerhead with reference to an upper surface of a substrate pedestal that is to be positioned adjacent to the faceplate. Each of the actuator assemblies includes a piezoelectric stack and a lever having a first end and a second end. The lever is mechanically coupled on the first end to the piezoelectric stack and on the second end to the showerhead to displace the showerhead in at least one direction of tilt. The lever is operable to amplify mechanically a displacement of the piezoelectric stack. A lever pivot point is coupled to the lever and is located between the first end and the second end of the lever.