Piezoelectric Valve Positioning for Precise ALD Flow Control
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Solution Overview
Problem
In semiconductor manufacturing processes using atomic layer deposition (ALD), existing valve devices face challenges in precisely adjusting flow rates due to temperature sensitivity and frequent operation, leading to valve degradation and increased man-hours for flow adjustments.
Innovation Solution
A valve device with a main actuator and an adjusting actuator, such as a piezoelectric actuator, allows for precise control of flow rates by adjusting the position of the valve element, reducing manual intervention and extending valve lifespan.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If pneumatic adjustment or mechanical adjustment is used in air driven valve, then flow rate adjustment is possible, but precise flow rate adjustment is difficult
Solution Approach 1:
The patent replaces pneumatic and mechanical adjustment systems with an electric motor-driven positioning system. The motor precisely controls the valve element's position through electrical signals, enabling accurate flow rate adjustment without the imprecision of pneumatic/mechanical methods while maintaining operational ease through electronic control.
Solution Approach 2:
The patent changes the control parameter from pneumatic pressure or mechanical linkage position to electrical motor position. By using motor rotation angle as the control parameter, the system achieves precise flow rate adjustment through electrical signal control, resolving the contradiction between precision and ease of operation.
2Productivity
If valve is opened and closed at high frequency in ALD process, then film deposition control is improved, but valve ages and changes over time requiring significant man-hours for flow adjustment
Solution Approach 1:
The patent replaces the traditional mechanical valve positioning system with an electric motor-driven system. This substitution reduces mechanical wear from high-frequency operations, improving valve reliability and stability while maintaining the productivity benefits of rapid opening/closing cycles in ALD processes.
Solution Approach 2:
The motor-driven positioning system provides self-adjustment capabilities through electronic control, reducing the need for manual flow adjustment interventions. The system automatically compensates for aging effects, decreasing maintenance man-hours while sustaining high-frequency operation for efficient film deposition.
3Stability of the object's composition
If valve is provided close to processing chamber for high frequency operation, then process gas supply stability is improved, but valve is readily affected by high temperature
Solution Approach 1:
The patent changes the actuation mechanism from temperature-sensitive pneumatic/mechanical systems to electric motor actuation. The motor system is less sensitive to high-temperature environmental effects, allowing the valve to be positioned close to the processing chamber for stable process gas supply while mitigating temperature-related performance degradation.
4Quantity of substance
If size of substrate diameter is increased to secure flow rate, then flow rate is improved, but manufacturing complexity increases
Solution Approach 1:
The patent replaces mechanical solutions (increasing substrate diameter to increase flow) with an electrically controlled valve positioning system. The motor-driven system precisely controls valve opening degree to regulate flow rate, eliminating the need to increase substrate size and thereby reducing manufacturing complexity while maintaining adequate flow rates.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The valve device enables immediate and precise flow rate adjustments, significantly reducing man-hours required for flow control and maintaining accuracy over time, even in high-temperature environments.
Implementation Method 1
an adjusting actuator for adjusting a position of the operation member positioned in the open position
Data Source
AI summary
A valve device that greatly reduces man-hours for flow adjustment includes a valve body that defines a flow path, a valve element provided so as to be capable of opening and closing the flow path of the valve body, an operation member that operates the valve element and is moveably provided between a closed position where the valve element closes the flow path and an open position where the valve element opens the flow path, set in advance, in opening and closing directions that allow the valve element to open and close the flow path, a main actuator that moves the operation member in the opening direction, and a piezoelectric actuator for adjusting a position of the operation member positioned in the open position.